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Structure and Electrochemical Behavior of AlN, AlTiN, and AlTiSiN Physical Vapor Deposition Coatings in 3% NaCl Solution

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Abstract

Thin coatings AlN, AlTiN, and AlTiSiN were deposited by pulsed magnetron sputtering. High-speed steel T1, structural carbon steel 1017, and hard alloy HG30 were used as substrates. The magnetron current, nitrogen content in the gas mixture, and bias voltage on the substrate were changed to obtain nanostructured and amorphous coating layers with different elemental compositions. The microstructure, defects, and elemental composition of the coatings were investigated on an Ultra 55 field emission electron microscope with an EDX microanalysis system. Voltammetry and impedance spectroscopy was performed on coated samples in 3% NaCl solution. The corrosion behavior of the coatings was characterized by the corrosion current density icorr and the polarization resistance Rp (at the corrosion potential). The research shows that the investigated coatings (except for AlN) are electrochemically active, and corrosion processes occur not only on the substrate in the discontinuities of the coating but also on the coating surface. The corrosion current density for AlN and AlTiSiN coatings on a T1 substrate is about 0.1 μA cm−2. The paper discusses factors influencing the corrosion behavior of the coatings under study.

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Funding

The results were obtained within the framework of the State task of the Ministry of Science and Higher Education of the Russian Federation (Project No. FSNM-2020-0026).

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Authors and Affiliations

  1. Perm National Research Polytechnic University, 29 Komsomolsky pr., Perm, Russia, 614990

    Anna Kameneva & Natalia Bublik

  2. Perm State University, Perm, Russia

    Vladimir Kichigin

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  1. Anna Kameneva
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Correspondence to Anna Kameneva.

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The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper. The authors declare the following financial interests/personal relationships which may be considered as potential competing interests.

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Kameneva, A., Kichigin, V. & Bublik, N. Structure and Electrochemical Behavior of AlN, AlTiN, and AlTiSiN Physical Vapor Deposition Coatings in 3% NaCl Solution. J. of Materi Eng and Perform 31, 10402–10411 (2022). https://doi.org/10.1007/s11665-022-07030-w

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