Abstract
Successful brazing using Cu-based nanostructured brazing fillers at temperatures much below the bulk melting temperature of Cu was recently demonstrated (Lehmert et al. in, Mater Trans 56:1015–1018, 2015). The Cu-based nano-fillers are composed of alternating nanolayers of Cu and a permeable, non-wetted AlN barrier. In this study, a thermodynamic model is derived to estimate the melting point depression (MPD) in such Cu/AlN nano-multilayers (NMLs) as function of the Cu nanolayer thickness. Depending on the melting route, the model predicts a MPD range of 238-609 K for Cu10nm/AlN10nm NMLs, which suggests a heterogeneous pre-melting temperature range of 750-1147 K (476-874 °C), which is consistent with experimental observations. As suggested by basic kinetic considerations, the observed Cu outflow to the NML surface at the temperatures of 723-1023 K (450-750 °C) can also be partially rationalized by fast solid-state diffusion of Cu along internal interfaces, especially for the higher temperatures.
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Acknowledgment
The authors acknowledge Benjamin Lehmert (Dortmund University of Technology, Germany) for sputter deposition of the Cu/AlN NMLs in Fig. 1, as well as Fabio La Mattina and Ivan Shorubalko (Empa) for performing the cross-sectional He-FIB analysis in Fig. 1. The financial support of EU FP7-PEOPLE-2013-IRSES Project EXMONAN—Experimental investigation and modelling of nanoscale solid state reactions with high technological impact is greatly acknowledged. GK thanks the TÁMOP-4.2.1.B-10/2/KONV-2010-0001 and the TÁMOP-4.2.2.A-11/1/KONV-2012-0019 project in the framework of the New Széchenyi Plan, supported by the European Union, and co-financed by the European Social Fund.
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This article is an invited submission to JMEP selected from presentations at the Symposium “Interface Design and Modeling,” belonging to the Topic “Joining and Interfaces” at the European Congress and Exhibition on Advanced Materials and Processes (EUROMAT 2015), held September 20-24, 2015, in Warsaw, Poland, and has been expanded from the original presentation.
Appendix 1: Physico-Chemical Properties for the Cu/AlN NML System
Appendix 1: Physico-Chemical Properties for the Cu/AlN NML System
The standard melting point and molar melting entropy of Cu are \(T_{m}^{\text{o}}\) = 1357.77 K (Ref 23) and \(\Delta_{m} S_{\text{mol}}^{\text{o}}\) = 9.51 J/mol K (Ref 23), respectively. The standard Gibbs energy change accompanying melting of pure Cu below its standard melting point (J/mol) is obtained from (Ref 23):
The T-dependence of the molar volume of solid Cu (cm3/mol) is obtained from (Ref 74-76):
The standard surface tension \(\sigma_{l/g}^{\text{o}}\) (J/m2) and surface energy \(\sigma_{s/g}^{\text{o}}\) (J/m2) of Cu equal (Ref 77, 78):
The liquid/barrier interfacial energy is written from the Young-Dupré equation as (Ref 79):
where \(\sigma_{b/g}^{\text{o}}\) (J/m2) is the surface energy of the barrier (AlN in our case), \(W_{l/b}^{\text{o}}\) (J/m2) is the adhesion energy between the liquid metal and the barrier, which can be expressed as
At the Cu melting point, \(\sigma_{l/b}^{\text{o}}\) = 1.30 J/m2 (see Eq 10). The surface energy of AlN is about (Ref 80) (J/m2):
The contact angle of liquid Cu on AlN, being a covalent and non-reactive ceramic, is about 150° (Ref 79). Thus, as follows from Eq 13, the adhesion energy at the melting point of Cu is about \(W_{l/b}^{\text{o}}\) = 0.17 J/m2, which to a first approximation is taken T-independent. Thus, the T-dependence of \(\sigma_{l/b}^{\text{o}}\) (J/m2) is obtained by combining Eq 10, 12, 14:
The interface between solid Cu and AlN is incoherent (Ref 15, 16). Neglecting lattice mismatch strain (Ref 69), the adhesion energy is similar to that of the liquid Cu, i.e., \(W_{s/b}^{\text{o}}\) = 0.17 J/m2. Then, the solid metal/barrier interfacial energy approximately equals (see Eq 11, 12, 14):
To a first approximation, the grain boundary energy of the barrier layer can be taken as 1/3 of its surface energy, \(\sigma_{b/g}^{\text{o}}\) in Eq 14 (Ref 81), i.e.,
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Kaptay, G., Janczak-Rusch, J. & Jeurgens, L.P.H. Melting Point Depression and Fast Diffusion in Nanostructured Brazing Fillers Confined Between Barrier Nanolayers. J. of Materi Eng and Perform 25, 3275–3284 (2016). https://doi.org/10.1007/s11665-016-2123-3
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DOI: https://doi.org/10.1007/s11665-016-2123-3