Skip to main content
Log in

Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering

  • Published:
Journal of Materials Engineering and Performance Aims and scope Submit manuscript

Abstract

Ti-Si-N-O coatings were deposited on AISI D2 tool steel and silicon substrates by dc reactive magnetron co-sputtering using a target of Ti-Si with a constant area ratio of 0.2. The substrate temperature was 400 °C and reactive atmosphere of nitrogen and argon. For all samples, argon flow was maintained constant at 25 sccm, while the flow of the nitrogen was varied to analyze the structural changes related to chemical composition and resistivity. According to results obtained by x-ray diffraction and stoichiometry calculations by x-ray energy dispersive spectroscopy the Ti-Si-N-O coatings contain two solid solutions. The higher crystalline part corresponds to titanium oxynitrure. Hardness tests on the coatings were carried out using the indentation work model and the hardness value was determined. Finally, the values of hardness were corroborated by nanoindentation test, and values of Young’s modulus and elastic recovery were discussed. We concluded that F2TSN sample (FAr = 25 sccm, FN = 5 sccm, P = 200 W, and PW = 8.9 × 10−3 mbar) presented the greatest hardness and the lowest resistivity values, due to its preferential crystalline orientation.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7

Similar content being viewed by others

References

  1. S.H. Kim, J.W. Jang, S.S. Kang, K.H. Kim, Synthesis and Mechanical Evaluation of Nanocomposite Coating Layer of nc-TiN/a-Si3N4 on SKD 11 Steel by Sputtering, J. Mater. Process. Technol., 130–131, 2002, p 283–288, in English

    Article  Google Scholar 

  2. H. Watanabe, Y. Sato, Ch. Nie, A. Ando, S. Ohtani, N. Iwamoto, The Mechanical Properties and Microstructure of Ti-Si-N Nanocomposite Coatings by Ion Plating, Surf. Coat. Technol., 169–170, 2003, p 452–455, in English

    Article  Google Scholar 

  3. J.S. Reid, E. Kolawa, C.M. Garland, M.-A. Nicolet, F. Cardone, D. Gupta, R.P. Ruiz, Amorphous (Mo, Ta, or W)-Si-N Diffusion Barriers for Al Metallizations, J. Appl. Phys., 79(2), 1996, p 1109–1115, in English

    Article  CAS  Google Scholar 

  4. K. Nakajima, Y. Akasaka, K. Miyano, M. Takahashi, S. Suehiro, K. Suguro, Formation Mechanism of Ultrathin WSiN Barrier Layer in a W/WNx/Si System, Appl. Surf. Sci., 117–118, 1997, p 312–316, in English

    Article  Google Scholar 

  5. F. Letendu, M.C. Hugon, B. Agius, I. Vickridge, C. Berthier, J.M. Lameille, TaSiN Diffusion Barriers Deposited by Reactive Magnetron Sputtering, Thin Solid Films, 513(1–2), 2006, p 118–124, in English

    Article  CAS  Google Scholar 

  6. Y.-J. Lee, B.-S. Suh, M.-S. Kwon, C.-O. Park, Barrier Properties and Failure Mechanism of Ta-Si-N Thin films for Cu Interconnection, J. Appl. Phys., 85(3), 1999, p 1927–1934, in English

    Article  CAS  Google Scholar 

  7. J. Bonitz, R. Ecke, S.E. Schulz, T. Gessner, Different SiH4 Treatments of CVD TiN Barrier Layers, Microelectron. Eng., 82(3–4), 2005, p 618–622, in English

    Article  CAS  Google Scholar 

  8. H.-E. Cheng, W.-J. Lee, C.-M. Hsu, The Effect of Deposition Temperature on the Properties of TiN Diffusion Barriers Prepared by Atomic Layer Chemical Vapor Deposition, Thin Solid Films, 485(1–2), 2005, p 59–65, in English

    Article  CAS  Google Scholar 

  9. L. Gao, J. Li, T. Kusunose, K. Niihara, Preparation and Properties of TiN-Si3N4 Composites, J. Eur. Ceram. Soc., 24(2), 2004, p 381–386, in English

    Article  CAS  Google Scholar 

  10. J. Procházka, P. Karvánková, M.G.J. Vepřek-Heijman, and S. Vepřek, Conditions Required for Achieving Superhardness of ≥45 GPa in nc-TiN/a-Si3N4 Nanocomposites, Mater. Sci. Eng. A, 2004, 384(1–2), p 102–116, in English

  11. E.V. Shalaeva, S.V. Borisov, O.F. Denisov, M.V. Kuznetsov, Metastable Phase Diagram of Ti-Si-N(O) Films (CSi < 30 at.%), Thin Solid Films, 339(1–2), 1999, p 129–136, in English

    Article  CAS  Google Scholar 

  12. Y.C. Ee, Z. Chen, T.M. Lu, Z.L. Dong, S.B. Law, Low Temperature Physical-Chemical Vapor Deposition of Ti-Si-N-O Barrier Films, Electrochem. Solid-State Lett., 9(3), 2006, p G100–G103, in English

    Article  CAS  Google Scholar 

  13. P.M. Smith, J.S. Custer, Chemical Vapor Deposition of Titanium-Silicon-Nitride Films, Appl. Phys. Lett., 70(23), 1997, p 3116–3118, in English

    Article  CAS  Google Scholar 

  14. Y.C. Ee, Z. Chen, S.B. Law, S. Xu, Formation and Characterization of Ti-Si-N-O Barrier Films, Thin Solid Films, 504(1–2), 2006, p 218–222, in English

    Article  CAS  Google Scholar 

  15. A.M. Korsunsky, M.R. McGurk, S.J. Bull, T.F. Page, On the Hardness of Coated System, Surf. Coat. Technol., 99 (1–2), 1998, p 171–183, in English

    Article  CAS  Google Scholar 

  16. M. McKeehan, B.E. Warren, X-Ray Study of Cold Work in Thoriated Tungsten, J. Appl. Phys., 24(1), 1953, p 52–56, in English

    Article  CAS  Google Scholar 

  17. C. Louro, A. Cavaleiro, Mechanical Behaviour of Amorphous W-Si-N Sputtered Films After Thermal Annealing at Increasing Temperatures, Surf. Coat. Technol., 123(2–3), 2000, p 192–198, in English

    Article  CAS  Google Scholar 

  18. S. Vepřek, S. Reiprich, A Concept for the Design of Novel Superhard Coatings, Thin Solid Films, 268(1–2), 1995, p 64–71, in English

    Article  Google Scholar 

  19. J.R. Tuck, A.M. Korsunsky, R.I. Davidson, S.J. Bull, D.M. Elliott, Modelling of the Hardness of Electroplated Nickel Coatings on Copper Substrates, Surf. Coat. Technol., 127, 2000, p 1–8, in English

    Article  CAS  Google Scholar 

Download references

Acknowledgments

This work was supported by CONACYT by means of the project 58653. Authors gratefully acknowledge Pedro García Jiménez and José Eleazar Urbina Álvarez at CINVESTAV Unidad Querétaro, as well as, Marcela Guerrero and Ana B. Soto at Departamento de Física - CINVESTAV, for their technical assistance.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Leandro García-González.

Rights and permissions

Reprints and permissions

About this article

Cite this article

García-González, L., Hernández-Torres, J., Mendoza-Barrera, C. et al. Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering. J. of Materi Eng and Perform 17, 580–585 (2008). https://doi.org/10.1007/s11665-007-9141-0

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11665-007-9141-0

Keywords

Navigation