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Low energy ion beam assisted grain size evolution in thin film deposition

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Abstract

In this paper, we demonstrate the value of applying new microstructural metrics in the characterization of grain size variations associated with the effects of very low energy ion beam assisted deposition of nickel thin films. It is shown that the apparent changes in grain size are associated with specific texture components. It is suggested that these descriptions of grain growth during deposition may provide more meaningful interpretations of the atomistic level mechanisms influencing grain size changes associated with very low energy ion beam deposition of thin films.

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Authors and Affiliations

  1. Rensselaer Polytechnic Institute, USA

    J. Trogolo

  2. IBM Research Corporation, USA

    R. Roy

  3. North Carolina State University, USA

    J. J. Cuomo

Authors
  1. Krishna Rajan
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  2. R. Roy
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  3. J. Trogolo
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  4. J. J. Cuomo
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Rajan, K., Roy, R., Trogolo, J. et al. Low energy ion beam assisted grain size evolution in thin film deposition. J. Electron. Mater. 26, 1270–1273 (1997). https://doi.org/10.1007/s11664-997-0068-x

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  • DOI: https://doi.org/10.1007/s11664-997-0068-x

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