Abstract
Highly sensitive CO gas sensors based on heterocontacts of ZnO:Al on La0.8Sr0.2Co0.5Ni0.5O3 (LSCNO) were fabricated successfully. La0.8Sr0.2Co0.5Ni0.5O3 thin films were coated on (100) silicon wafers by a sol-gel method including the Pechini process followed by a spin-coating procedure. Then, ZnO:Al films prepared by radiofrequency (RF) magnetron sputtering at various oxygen partial pressures and deposited on as-deposited La0.8Sr0.2Co0.5Ni0.5O3 films were investigated. The results revealed that the CO sensing ability of the film prepared with the ratio of O2/Ar = 5/5 (ratio of volume flow rate) was the worst, owing to the highest (002) plane orientation in the ZnO:Al film. In contrast, the ZnO:Al film prepared with O2/Ar = 3/7 exhibited better CO sensitivity. Furthermore, all two-layer samples showed higher CO sensitivities than single-layer samples. The CO sensitivity of ZnO:Al/La0.8Sr0.2Co0.5Ni0.5O3 thin film was 45% for 500 ppm CO at a sensing temperature of 200°C.
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F. Reti, M. Fleischer, H. Meixner, J. Giber. Sens. Actuators B Chem. 18–19, 573 (1994) doi:10.1016/0925-4005(93)01157-Y
N. Ichinose, H. Okuma. Ceram. Jpn. 11, 205 (1976)
A. Cimino, E. Molinaru, F. Cramarossa. J. Catal. 2, 315 (1963) doi:10.1016/0021-9517(63)90074-5
W. Göpel, J. Vac. Sci. Technol. 15, 1298 (1978) doi:10.1116/1.569757
P.K. Gallagher, D.W. Johnson, E.M. Vogel, J. Am. Ceram. Soc. 60, 28 (1978) doi:10.1111/j.1151-2916.1977.tb16086.x
E.M. Vogel, D.W. Johnson Jr., P.K. Gallagher, J. Am. Ceram. Soc. 60, 31 (1977) doi:10.1111/j.1151-2916.1977.tb16087.x
C.M. Chiu, Y.H. Chang. Mater. Sci. Eng. A 266, 93 (1999) doi:10.1016/S0921-5093(99)00037-4
C.M. Chiu, Y.H. Chang, Thin Solid Films 342, 15 (1999) doi:10.1016/S0040-6090(98)01071-2
C.K.M. Shaw, J.A. Kilner, S.J. Skinner, Solid State Ion. 135, 765 (2000) doi:10.1016/S0167-2738(00)00376-3
M. Kuwabara, T. Ide, Am. Ceram. Soc. Bull. 66, 1401 (1987)
C.M. Chiu, Y.H. Chang, Sens. Actuators B Chem. 54, 236 (1999) doi:10.1016/S0925-4005(99)00117-3
E. Fortunato, L. Pereira, H. Águas, I. Ferreira, R. Martins, Sensors Actuators A 116, 119 (2004) doi:10.1016/j.sna.2004.01.065
K.C. Park, D.Y. Ma, K.H. Kim, Thin Solid Films 305, 201 (1997) doi:10.1016/S0040-6090(97)00215-0
S.-Y. Chu, W. Water, J.-T. Liaw, Ultrasonics 41, 133 (2003) doi:10.1016/S0041-624X(02)00430-4
J.F. Chang, H.H. Kuo, I.C. Leu, M.H. Hon, Sens. Actuators B Chem. 84, 257 (2003)
A. Chtanov, M. Gal, Sensors Actuators B 79, 196 (2001) doi:10.1016/S0925-4005(01)00875-9
Z. Zhan, J. Lu, W. Song, D. Jiang, J. Xu, Mater. Res. Bull. 42, 228 (2007) doi:10.1016/j.materresbull.2006.06.006
L.P. Singh, J.M. Bhatnagar, S. Tanaka, H. Tsue, M. Moru, Anal. Chim. Acta 546, 199 (2005) doi:10.1016/j.aca.2005.04.068
S.C. Navale, V. Ravi, I.S. Mulla, S.W. Gosavi, S.K. Kulkarni, Sensors Actuators B 126, 382 (2007) doi:10.1016/j.snb.2007.03.019
Y. Nakamura, A. Ando, T. Tsurutani, O. Okada, M. Miyayama, K. Koumoto, H. Yanagida, Chem. Lett. 54, 413 (1986) doi:10.1246/cl.1986.413
S. Aygün, D. Cann, Sensors Actuators B 106, 837 (2005) doi:10.1016/j.snb.2004.10.004
J.D. Choi, G.M. Choi, Sens. Actuators B Chem. 69, 120 (2000) doi:10.1016/S0925-4005(00)00519-0
J.H. Yu, G.M. Choi, Sens. Actuators B Chem. 61, 59 (1999) doi:10.1016/S0925-4005(99)00280-4
Y.L. Tsai, D.T. Ray, H.S. Liu, C.F. Dai, Y.H. Chang, Mater. Sci. Eng. A 293, 39 (2000) doi:10.1016/S0921-5093(00)01018-2
N. Fujimura, T. Nishihara, S. Goto, J. Xu, T. Ito, J. Cryst. Growth 130, 269 (1993) doi:10.1016/0022-0248(93)90861-P
E.M. Bachari, G. Baud, S. Ben Amor, M. Jacquet, Thin Solid Films 348, 165 (1999) doi:10.1016/S0040-6090(99)00060-7
R. Mochinaga, T. Yamasaki, T. Arakawa, Sens. Actuators B Chem. 52, 96 (1998) doi:10.1016/S0925-4005(98)00262-7
X. Zhou, Q. Cao, H. Huang, P. Yang, Y. Hu, Mater. Sci. Eng. B 99, 44 (2003) doi:10.1016/S0921-5107(02)00501-9
W.J. Moon, J.H. Yu, G.M. Choi, Sens. Actuators B Chem. 87, 464 (2002) doi:10.1016/S0925-4005(02)00299-X
J. Watson, K. Ihokura, G.S.V. Coles, Meas. Sci. Technol. 4, 711 (1993) doi:10.1088/0957-0233/4/7/001
Y.C. Chen, Y.H. Chang, G.J. Chen, Y.L. Chai, D.T. Ray, Sensors Actuators B 96, 87 (2003) doi:10.1016/S0925-4005(03)00489-1
Acknowledgement
The authors wish to thank the National Science Council of ROC for financial support under Grant No. NSC-90-2216-E-006-065.
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Yang, WD., Chang, YH., Huang, CC. et al. Microstructure and Characteristics of Thin-Film La0.8Sr0.2Co0.5Ni0.5O3/ZnO:Al Heterocontact CO Sensors Prepared by RF Magnetron Sputtering. J. Electron. Mater. 38, 460–467 (2009). https://doi.org/10.1007/s11664-008-0598-x
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DOI: https://doi.org/10.1007/s11664-008-0598-x