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Granular Films for Use as Thin-Film Resistors

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In this paper we discuss thin-film electrical resistors utilizing granular films of the type (Co,Ni)-(Al,Si)-O and their electrical resistive properties. Resistive properties of the granular film resistors drastically change with metal content and after annealing at 450°C. The values of temperature coefficient of resistance (TCR) in the optimum metal content of the granular films were as low as those of conventional metallic alloy film resistors. The values of sheet resistance were much higher than those of conventional metallic alloy resistors. Therefore, granular films are useful for application to thin-film resistors with the goal of miniaturizing them.

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  1. Semiconductor Device and Sensor Laboratory, Toyota Central Research and Development Laboratories, Inc, Nagakute, Aichi, 480-1192, Japan

    H. Yamadera

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  1. H. Yamadera
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Correspondence to H. Yamadera.

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Yamadera, H. Granular Films for Use as Thin-Film Resistors. J. Electron. Mater. 37, 1020–1023 (2008). https://doi.org/10.1007/s11664-008-0462-z

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  • DOI: https://doi.org/10.1007/s11664-008-0462-z

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