Abstract
Optical emission and surface compositional change during the laser-etching process of CdTe are reported. The etching rate increases in proportion to the laser energy density. However, the increase in etching rate is suppressed because ablation plasma plumes generated by the laser irradiation at the energy densities above 0.4 J/cm2 shield the laser beam. The etching rate at the energy density of 1.0 J/cm2 has been determined to be 91 nm/pulse. Also, 80-µm-deep and 55-µm-wide trenches have been formed with the laser-etching process.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
J. Baylet et al., J. Electron. Mater. 33, 690 (2004).
N. Niraula, K. Yasuda, Y. Nakanishi, K. Uchida, T. Mabuchi, Y. Agata, and K. Suzuki, J. Electron. Mater. 33, 645 (2004).
G.C. Sun, H. Samic, J.C. Bourgoin, D. Chambellan, O. Gal, and P. Pillot, IEEE Trans. Nucl. Sci. 51, 2400 (2004).
J.D. Benson, A.J. Stoltz, J.B. Varesi, M. Martinka, A.W. Kaleczyc, L.A. Almeida, P.R. Boyd, and J.H. Dinan, J. Electron. Mater. 33, 543 (2004).
S.K. Pandey, U. Tiwari, R. Raman, C. Prakash, V. Krishna, V. Dutta, and K. Zimik, Thin Solid Films 473, 54 (2005).
P. Sagan, I.S. Virt, J. Zawislak, I.O. Rudyj, and M. Kuzma, Thin Solid Films 451–452, 224 (2004).
M. Niraula, Y. Agata, K. Yasuda, A. Nakamura, T. Aoki, and Y. Hatanaka, Phys. Status Solidi (c) 1, 1071 (2004).
V.A. Gnatyuk, T. Aoki, O.S. Gorodnychenko, and Y. Hatanaka, Appl. Phys. Lett. 83, 3704 (2003).
David R. Lide and H.P.R. Frederikse, CRC Handbook of Chemistry and Physics, 76th ed. (Boca Raton: CRC Press, 1996), pp. 10-10–10-98.
O. Eryu, K. Murakami, K. Masuda, A. Kasuya, and Y. Nishina, Appl. Phys. Lett. 54, 2716 (1989).
X. Mao, W. Chan, M. Caetano, M A. Shannon, and R.E. Russo, Appl. Surf. Sci. 96–98, 126 (1996).
A. Lenk, B. Schultrich, T. Witke, and H.-J. Weiß, Appl. Surf. Sci. 109/110, 419 (1997).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Abe, K., Eryu, O., Nakashima, S. et al. Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe. J. Electron. Mater. 34, 1428–1431 (2005). https://doi.org/10.1007/s11664-005-0201-7
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-005-0201-7