Abstract
The grain-size effect on shape-memory behavior of fine-grained Ti35.0Ni49.7Zr15.4 thin films was investigated by transmission electron microscopy. The films, with various grain sizes ranging from about 150 to about 400 nm, were prepared by heat treatment of amorphous films at the three different annealing temperatures of 773, 873, and 973 K, for three different annealing times of 5 minutes, 1 hour, and 10 hours. The film annealed at 773 K for 5 minutes showed a nearly single phase of (Ti,Zr)Ni, while the films annealed at high annealing temperatures and/or long annealing times showed λ 1 precipitates. For a high annealing temperature of 973 K, the critical yield stress (σ c) was dominantly dependent on the grain size of the matrix, obeying the Hall-Petch equation. On the other hand, for a low annealing temperature of 773 K, σ c was dominantly dependent on the amount of λ 1 precipitates. The M S temperature decreases almost linearly with increasing σ c. The films showed sufficient fracture toughness, probably due to the nanometer scale of the grain size and the agglomerated shape of λ 1 particles.
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Sawaguchi, T., Sato, M. & Ishida, A. Grain-size effect on shape-memory behavior of Ti35.0Ni49.7Zr15.4 thin films. Metall Mater Trans A 35, 111–119 (2004). https://doi.org/10.1007/s11661-004-0114-8
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DOI: https://doi.org/10.1007/s11661-004-0114-8