Abstract
In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.
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The authors are grateful to Prof. Xiaolin Wang from University of Wollongong for his valuable discussions and assistance in the present paper.
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Funded by Shandong Government Financial Supporting (No. L37002013098), Jinan Government Financial Supporting (Nos. JK201303067 and 301305033) and the National Natural Science Foundation of China (Nos. 51771103, 51471099 and 51571132)
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Niu, Y., Guo, L., Zheng, Y. et al. Formation of Zr-contained Amorphous Alloy Films by Magnetron Co-sputtering. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 34, 662–667 (2019). https://doi.org/10.1007/s11595-019-2101-3
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DOI: https://doi.org/10.1007/s11595-019-2101-3