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Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme

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Abstract

We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (λ/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed.

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Acknowledgments

This work was supported by 973 Program of China (No. 2013CBA01700) and National Natural Science Funds (Nos. 61138002 and 61177013).

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Authors and Affiliations

  1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu, 610209, China

    Yaohui Wang, Na Yao, Wei Zhang, Jiayu He, Changtao Wang, Yanqin Wang, Zeyu Zhao & Xiangang Luo

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  1. Yaohui Wang
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  2. Na Yao
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  3. Wei Zhang
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  4. Jiayu He
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  5. Changtao Wang
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  6. Yanqin Wang
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  7. Zeyu Zhao
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  8. Xiangang Luo
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Correspondence to Xiangang Luo.

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Wang, Y., Yao, N., Zhang, W. et al. Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme. Plasmonics 10, 1607–1613 (2015). https://doi.org/10.1007/s11468-015-9966-6

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  • DOI: https://doi.org/10.1007/s11468-015-9966-6

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