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High Plasmonic Resonant Reflection and Transmission at Continuous Metal Films on Undulated Photosensitive Polymer

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Abstract

Whereas noble metal films deposited directly onto an undulated photosensitive polymer exhibit plasmon-mediated resonant transmission of free-space waves accompanied by excess losses of approximately 40 %, adequate hard baking of the photosensitive polymer, together with pre- and post-deposition of nanometer-thick ZnS or MgF2 dielectric interfacial layers, restores excellent propagation conditions for the long-range plasmon mode, reducing resonant transmission excess losses to 10 %, and creating the conditions for the experimental evidence of the long-sought plasmonic anomalous reflection phenomenon.

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Authors and Affiliations

  1. Institute of Solid State Physics, Bulgarian Academy of Sciences, 1784, Sofia, Bulgaria

    T. Tenev, I. Miloushev, R. Peyeva & S. Tonchev

  2. Laboratoire H. Curien UMR CNRS 5516, Lyon University, 42000, Saint-Étienne, France

    S. Tonchev & O. Parriaux

Authors
  1. T. Tenev
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  2. I. Miloushev
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  3. R. Peyeva
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  4. S. Tonchev
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  5. O. Parriaux
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Correspondence to O. Parriaux.

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Tenev, T., Miloushev, I., Peyeva, R. et al. High Plasmonic Resonant Reflection and Transmission at Continuous Metal Films on Undulated Photosensitive Polymer. Plasmonics 9, 311–317 (2014). https://doi.org/10.1007/s11468-013-9626-7

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  • DOI: https://doi.org/10.1007/s11468-013-9626-7

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