Results of experiments on deposition of thin molybdenum films on glass substrates by high-power impulse magnetron sputtering are presented. Two high-current modes with different pulse frequencies and durations are used. Properties of the produced molybdenum films are compared with those of films produced by magnetron sputtering at a direct current. It is shown that this method allows the resistivity of molybdenum films to be decreased and their reflectance in the visible range to be increased.
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References
J. H. Scofield, A. D. Duda, D. Albin, et al., Thin Solid Films, 260, 26–31 (1995).
P. Bommersbach, L. Arzel, M. Tomassini, et al., Prog. Photovolt: Res. Appl., 21, No. 3, 332–343 (2013).
J. H. Yoon, T. Y. Seong, and J. H. Jeong, Prog. Photovolt: Res. Appl., 21, No. 1, 58–63 (2013).
M. Powalla and B. Dimmler, Thin Solid Films, 361–362, 540–546 (2000).
K. Orgassa, H. W. Schock, and J. H. Werner, Thin Solid Films, 431–432, 387–391 (2003).
M. Samuelsson, D. Lundin, J. Jensen, et al., Surf. Coat. Technol., 205, 591–596 (2010).
I. Repins, M. A. Contreras, B. Egaas, et al., Prog. Photovolt: Res. Appl., 16, 235–239 (2008).
S. A. Vanalakar, G. L. Agawane, S. W. Shin, et al., J. Alloys Compd., 619, 109–121 (2015).
H. Fray, Handbook of Thin Film Technology, Springer, Berlin (2015).
J. N. Alexander, S. Higashiya, D. Caskey, Jr., et al., Sol. En. Mat. Sol. Cells, 125, 47–53 (2014).
Z. H. Li, E. S. Cho, and S. J. Kwon, Appl. Surf. Sci., 257, 9682–9688 (2011).
C. Roger, S. Noël, O. Sicardy, et al., Thin Solid Films, 548, 608–616 (2013).
C. H. Huang, H. L. Cheng, W. E. Chang, et al., Semicond. Sci. Technol., 27, 115020 (2012).
Z. C. Chang, H. H. Sung, C. Y. Chen, et al., Mater. Res. Innovat., 19, No. 8, 512–517 (2015).
X. Dai, A. Zhou, L. Feng, et al., Thin Solid Films, 567, 64–71 (2014).
S. S. Wang, C. Y. Hsu, V. Shiou, et al., J. Electron. Mater., 42, No. 1, 71–78 (2013).
Y. Pauleau, Vacuum, 61, 175–181 (2001).
S. Zhang, H. Xie, X. Zeng, et al., Surf. Coat. Technol., 122, 219–224 (1999).
P. Blosch, D. Gutter, A. Chirila, et al., Thin Solid Films, 519, 7453–7457 (2011).
A. L. Patterson, Phys. Rev., 56, 978–982 (1939).
P. M. P. Salome, J. Malaquias, P. A. Fernandes, et al., J. Phys. D, 43, 345501 (7 p) (2010).
S. F. Chen, S. J. Wang, W. D. Lee, et al., Atlas J. Mater. Sci., 2, No. 1, 54–59 (2015).
G. Zoppi, N. S. Beattie, J. D. Major, et al., J. Mater. Sci., 46, 4913–4921 (2011).
D. Zhou, H. Zhu, X. Liang, et al., Appl. Surf. Sci., 362, 202–209 (2016).
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 8, pp. 65–69, August, 2017.
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Zakharov, A.N., Solov’ev, A.A., Oskomov, K.V. et al. Properties of Molybdenum Films Produced by High-Power Impulse Magnetron Sputtering. Russ Phys J 60, 1336–1340 (2017). https://doi.org/10.1007/s11182-017-1218-0
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DOI: https://doi.org/10.1007/s11182-017-1218-0