The effect of graded-band-gap layers on the differential resistance of space-charge region in MIS structures based on MBE HgCdTe (x = 0.225) is examined. It is shown that the effect of resistance of the epitaxial-film bulk on the measured capacitance and resistance should be taken into account for correct determination of space-charge region parameters. The presence of near-surface layers with increased Cd contents results in an increase in the resistance of the space-charge region in strong inversion. The product of semiconductor resistance by area as high as 15 Ω⋅cm2 is obtained despite suppression of tunnel generation-recombination through deep levels in MIS structures with graded-band-gap layers. This might be due to background photogeneration and diffusion of minority charge carriers. The mechanisms for limitation of the differential resistance of space-charge region at different temperatures are discussed for n-HgCdTe (x = 0.225 and 0.292) and p-HgCdTe (x = 0.225).
Similar content being viewed by others
References
V. N. Ovsyuk, G. L. Kuryshev, Yu. G. Sidorov, et al., IR Photodetector Arrays [in Russian], Nauka, Novosibirsk, 2001.
A. V. Voitsekhovskii, S. N. Nesmelov, and S. M. Dzyadukh, Russ. Phys. J., No. 6, 584 (2005).
A. V. Voitsekhovskii, S. N. Nesmelov, S. M. Dzyadukh et al., Fiz. Tekh. Poluprovodn., No. 11, 1327 (2008).
M. A. Kinch, Semicond. Semimet., 18, 313 (1981).
A. Rogalski, Infrared Detectors [Russian translation], Nauka, Novosibirsk, 2003.
V. Dhar, R. Ashokan, Z. A. D. Khan, and P. K. Basu, Semicond. Sci. Technol., No. 11, 1077 (1996).
V. Gopal, S.Gupta, R. K. Bhan et al., Infrared Physics and Technology, 44, 143 (2003).
A. V. Yartsev, Autometry, 43, No. 4, 83 (2007).
V. V. Antonov, Investigation into Electrical-Physical and Photoelectrical Characteristics of МОF-Structures Based on HgCdTe: Diss. Kand. Fiz. Mat. Nauk, Tomsk, 1985.
A. V. Voitsekhovskii and V. N. Davydov, Photoelectrical MIS-Structures from Narrow-Band Semiconductors [in Russian], Radio i Svyaz’, Tomsk, 1990.
W. He and Z. Celik-Butler, Solid-State Electron., 39, No. 1, 127 (1996).
J. P. Rosbeck and E. R. Blazejewski, J. Vacuum Science & Technology. A, 3, No. 1, 280 (1985).
M. A. Kinch, J. D. Beck, and W. T. Zwirble, in: Proc. Int. Electron Devices Meet., Washington, New York, 1980.
V. V. Vasil’ev and Yu. P. Mashukov, Fiz. Tekh. Poluprovodn., 41, No. 1, 38 (2007).
V. N. Ovsyuk and A. V. Yartsev, Appl. Phys. No. 5, 80 (2007).
V. I. Gaman, Physics of Semiconductor Devices [in Russian], Izd. Nauchn. Tekhn. Literatury, Tomsk, 2000.
R. S. Nakhmanson, Solid State Electron., 19, 745 (1976).
A. V. Voitsekhovskii, S. N. Nesmelov, S. M. Dzyadukh et al, Russ. Phys. J., No. 10, 1117 (2006).
B. S. Kerner, V. V. Osipov, O. V. Smolin, and A. N. Sukhanov, Reviews on Electronic Devices, ser. 2, Semiconductor Devices, No. 8, 3 (1989).
J. S. Blakemore, Semiconductor Statistics, Pergamon, London, 1962.
J. M. Lloyd, Thermal Imaging Systems, Plenum, New York, 1975.
R. K. Bian and V. Dhar, Infrared Physics & Technology, 41, 155 (2000).
V. L. Bonch-Bruevich and S. G. Kalashnikov, Semiconductor Physics [in Russian], Nauka, Moscow, 1990.
P. A. Borodovski, A. F. Bulygin, and V. S. Varavin, Fiz. Tekh. Poluprovodn., 32, No. 9, 1076 (1998).
O. P. Agnihorti, C. A. Musca, and L. Faraone, Semicond. Sci. Technol., No. 13, 839 (1998).
D. G. Ikusov, F. F. Sizov, S. V. Staryi, and V. V. Teterkin, Fiz. Tekh. Poluprovodn., 41, No. 2, 134 (1998).
G. H. Tsau, A. Sher, M. Madou, et al., J. Appl. Phys., 59, No. 4, 1238 (1986).
A. V. Yartsev, in: Book of Abstr. 19 Int. Sci. Tekhn. Conf. On Photoelectronics and Night-Vision Devices, Moscow, 2006.
Author information
Authors and Affiliations
Corresponding author
Additional information
Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 3–18, October, 2009.
Rights and permissions
About this article
Cite this article
Voitsekhovkii, A.V., Nesmelov, S.N. & Dzyadukh, S.M. Investigation into MIS structures based on gradedband-gap hetero-epitaxial HgCdTe grown by molecular-beam epitaxy using photo-emf and conductivity methods. Russ Phys J 52, 1003–1020 (2009). https://doi.org/10.1007/s11182-010-9332-2
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11182-010-9332-2