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High-intensity ion implantation - a technique to form finely dispersed intermetallic compounds in surface layers of metals

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Abstract

The results of experimental investigations of microstructure and phase composition of surface ion-alloyed layers of nickel, titanium, and iron formed under the conditions of high-intensity aluminum-ion implantation are presented. It is established that aluminum-ion implantation under high-intensity modes makes it possible to form finely-dispersed intermetallic phases of Me3Al (Me = Ni, Ti, Fe) and MeAl (Ni, Ti), as well as solid solutions of a composition variable with respect to depth in the surface layers measuring up to 2000 nm. It is shown that the average grain-size of intermetallic phases formed in ion-alloyed layers is 20–80 nm. Regions of localization of the phases thus formed over the implanted layer depth are determined.

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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 44–52, September 2004.

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Sharkeev, Y.P., Ryabchikov, A.I., Kozlov, E.V. et al. High-intensity ion implantation - a technique to form finely dispersed intermetallic compounds in surface layers of metals. Russ Phys J 47, 936–945 (2004). https://doi.org/10.1007/s11182-004-0004-y

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  • DOI: https://doi.org/10.1007/s11182-004-0004-y

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