Abstract
To enhance hydrophilicity and photocatalytic activity, N-doped and N–V-codoped TiO2 films were coated on glass substrates by the sol–gel dip-coating method. The substrates were previously coated with SiO2 using the same method. The coated samples, after annealing at 450 °C for 30 min in air, were analyzed by an X-ray diffractometer, scanning electron microscope, Fourier transform infrared spectroscope, X-ray photoelectron spectroscope, and UV–visible spectroscope. The SiO2/N–V-codoped TiO2 photocatalyst showed a narrower band gap (2.93 eV) compared to the SiO2/N-doped. Degradation tests, methyl orange under UV light and stearic acid under visible light, were performed in order to evaluate photocatalytic activity. It was observed that the SiO2/N–V-codoped photocatalyst was significantly better than the SiO2/N-doped TiO2. The presence of V and N in the TiO2 lattice motivated isolated energy levels near the conduction and valence bands, respectively, resulting in a narrowing of the band gap. Moreover, both of the energy levels could act as traps for photoexcited holes and electrons, reducing the recombination rate of charges, thus improving the photocatalytic activity of SiO2/N–V-codoped TiO2.
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R. Jaiswal, N. Patel, D.C. Kothari, A. Miotello, Appl. Catal. B 126, 47 (2012)
N. Guettaï, H. Ait Amer, Part I: parametric study. Desalination 185, 427 (2005)
C. Liu, X. Tang, C. Mo, Z. Qiang, J. Solid State Chem. 181, 913 (2008)
M. Xing, X. Li, J. Zhang, Sci. Rep. 4, 5493 (2014)
R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science 293, 269 (2001)
N.T. Nolan, D.W. Synnott, M.K. Seery, S.J. Hinder, A. Van Wassenhoven, S.C. Pillai, J. Hazard. Mater. 211–212, 88 (2011)
Z. Zhang, J.B.M. Goodall, D.J. Morgan, S. Brown, R.J.H. Clark, J.C. Knowles, N.J. Mordan, J.R.G. Evans, A.F. Carley, M. Bowker, J.A. Darr, J. Eur. Ceram. Soc. 29, 2343 (2009)
P. Periyat, D.E. McCormack, S.J. Hinder, S.C. Pillai, J. Phys. Chem. C 113, 3246 (2009)
Yu. Jiaguo, X. Zhao, Q. Zhao, Mater. Chem. Phys. 69, 25 (2001)
K. Miyashita, S. Kuroda, T. Ubukata, T. Ozawa, H. Kubota, J. Mater. Sci. 36, 3877 (2001)
C.D. Valentin, E. Finazzi, G. Pacchioni, A. Selloni, S. Livraghi, M.C. Paganini, E. Giamello, Chem. Phys. 339, 44 (2007)
T. Lindgren, J.M. Mwabora, E. Avendano, J. Jonsson, A. Hoel, C.G. Granqvist, S.E. Lindquist, Phys. Chem. B 107, 5709 (2003)
S. Yin, Q. Zhang, F. Saito, T. Sato, Chem. Lett. 32, 2996 (2003)
T. Matsumoto, N. Iyi, Y. Kaneko, K. Kitamura, Y. Takasu, Y. Murakami, Chem. Lett. 33, 1508 (2004)
H.Y. He, Res. Chem. Intermed. 36, 155 (2010)
J. Ananpattarachaia, P. Kajitvichyanukulb, S. Seraphin, J. Hazard. Mater. 168, 253 (2009)
J. Liu, R. Han, Y. Zhao, H. Wang, W. Lu, T. Yu, Y. Zhang, J. Phys. Chem. C 115, 4507 (2011)
A.K. Rumaiz, J.C. Woicik, E. Cockayne, H.Y. Lin, G.H. Jaffari, S.I. Shah, Appl. Phys. Lett. 95, 262111 (2009)
D.L. Liao, C.A. Badour, B.Q. Liao, J. Photochem. Photobiol. A Chem. 194, 11 (2008)
N.R. Mathews, E.R. Morales, M.A. Cortés-Jacome, J.A. Toledo Antonio, Sol. Energy 83, 1499 (2009)
Y.C. Lee, Y.P. Hong, H.Y. Lee, H. Kim, Y.J. Jung, K.H. Ko, H.S. Jung, K.S. Hong, J Colloid Interface Sci. 267, 127 (2003)
S. Lien, D. Wuu, W. Yeh, J. Liu, Sol. Energy Mater. Sol. Cells 90, 2710 (2006)
C. Di Valentin, G. Pacchioni, A. Selloni, Phys. Rev. Lett. 97, 166803 (2006)
T. Tölke, A. Heft, A. Pfuch, Thin Solid Films 516, 4578 (2008)
Ö. Kesmez, H.E. Çamurlu, E. Burunkaya, E. Arpaç, Sol. Energy Mater. Sol. Cells 93, 1833 (2009)
A. Eshaghi, R. Mozaffarinia, M. Pakshir, A. Eshaghi, Ceram. Int. 37, 327 (2011)
M. Nasir, J. Zhang, F. Chen, B. Tian, Res. Chem. Intermed. 39, 9886 (2013)
L. Chen, J. Tian, H. Qiu, Y. Yin, X. Wang, J. Dai, P. Wu, A. Wang, L. Chu, Ceram. Int. 35, 3275 (2009)
J. Chen, M. Yao, X. Wang, J. Nanopart. Res. 10, 163 (2008)
M.-C. Yang, T.-S. Yang, M.-S. Wong, Thin Solid Films 469–470, 1 (2004)
P.-G. Wu, C.-H. Ma, J.K. Shang, Appl. Phys. A 81, 1411 (2005)
D.G. Huang, S.J. Liao, W.B. Zhou, S.Q. Quan, L. Liu, Z.J. He, J.B. Wan, J. Phys. Chem. Solids 70, 853 (2009)
Y. Nakano, T. Morikawa, T. Ohwaki, Y. Taga, Appl. Phys. Lett. 86, 132104 (2005)
M.R. Bayati, A.Z. Moshfegh, F. Golestani-Fard, ElectrochimicaActa 55, 3093 (2010)
K. Guan, Surf. Coat. Technol. 191, 155 (2005)
A.T. Kuvarega, R.W.M. Krause, B.B. Mamba, J. Phys. Chem. C 115, 22110 (2011)
B. Qiu, M. Xing, J. Zhang, J. Am. Chem. Soc. 136, 5852 (2014)
H. Zhang, K. Tan, H. Zheng, Y. Gu, W.F. Zhang, Mater. Chem. Phys. 125, 156 (2011)
Y. Cong, J.L. Zhang, F. Chen, M. Anpo, J. Phys. Chem. C 111, 6976 (2007)
H. Li, G. Zhao, G. Han, B. Song, Surf. Coat. Technol. 201, 7615 (2007)
Acknowledgments
The authors express their deep gratitude to Mr. Armin Abazarpoor for helpful discussion on XRD and Mr. Mohammad Moballegh for his assistance in the XPS analysis.
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Khatibnezhad, H., Sani, M.A.F. Preparation and characterization of nanostructured TiO2 thin film codoped with nitrogen and vanadium on glass surface by sol–gel dip-coating method. Res Chem Intermed 41, 7349–7361 (2015). https://doi.org/10.1007/s11164-014-1816-1
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DOI: https://doi.org/10.1007/s11164-014-1816-1