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Protective oxide layers formed during electrochemical oxidation of hafnium carbide

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Powder Metallurgy and Metal Ceramics Aims and scope

The composition of oxide nanofilm formed on the HfC anode under electrolysis of a 3% NaCl solution at potentials between – 0.20 and +1.90 V is studied using the potentiodynamic method of polarization curves and Auger electron spectroscopy and SEM methods. The film consists of the upper layer formed in polymolecular chemosorption of O2 and Cl2 gases followed by the HfO2 + C (1 : 1) layer. Two inner layers represent a 7 at.% O2 solid solution in HfC and a mixture of HfC0.7O0.3 and HfO (7 : 1). The oxide film 30–40 nm thick formed at potentials up to 1.35 V is protective and ensures very high corrosion resistance of HfC without any further polarization.

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Correspondence to V. N. Talash.

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Translated from Poroshkovaya Metallurgiya, Vol. 48, No. 9–10 (469), pp. 133–139, 2009.

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Lavrenko, V.A., Talash, V.N., Desmaison-Brut, M. et al. Protective oxide layers formed during electrochemical oxidation of hafnium carbide. Powder Metall Met Ceram 48, 595–599 (2009). https://doi.org/10.1007/s11106-010-9173-0

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  • DOI: https://doi.org/10.1007/s11106-010-9173-0

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