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Investigation on Localized Etching Behaviors of Polymer Film by Atmospheric Pressure Plasma Jets

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Abstract

This paper investigates the effect of physical bombardment, chemical reaction etching and ultraviolet (UV) radiation on polymer film etching by atmospheric pressure He, O2 and He/O2 plasma jets. Physical morphologies and chemical compositions of the etched surfaces were analyzed. It was found that in the absence of oxygen-containing reactive species, the etched polymer surface was rough with ultra-low etching rate by He plasma jet, and the chemical compositions of the etched surface kept unchanged in this condition. UV radiation played the minimum role in the etching process and it only modify the film surface through photooxidation. Rapid and effective etching can only be achieved by the synergistic effects of charged particle’s bombardment, chemical reaction etching of reactive species and UV radiation. The results can provide reference for deeper understanding and better controlling the etching process of polymer films by an atmospheric pressure plasma jet.

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Acknowledgements

The work was supported by grants from the National Natural Science Foundation of China (Grant No. 51905002), Anhui Provincial Natural Science Foundation (Grant Nos. 2008085QE230, 2108085ME174, 2108085QE228), Open project of Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials (Grant No. GFST2021KF06), Open Project of Anhui Province Engineering Laboratory of Intelligent Demolition Equipment (Grant No. APELIDE2021B001), scientific research project of graduate student in Anhui Province (YJS20210345) and Postgraduate Academic Innovation Project of Anhui Province (2022xscx068).

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Authors and Affiliations

  1. Anhui Province Key Laboratory of Special Heavy Load Robot, Anhui University of Technology, No.59 Hudong Road, Ma’anshan, 243032, China

    Tao Wang, Xin Wang, Jiahao Wang, Shengquan Wang, Weizhi Yang & Liping Shi

  2. School of Mechanical Engineering, Anhui University of Technology, Ma’anshan, 243032, China

    Tao Wang, Xin Wang, Jiahao Wang, Shengquan Wang, Weizhi Yang, Meng Li & Liping Shi

  3. Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology, Ma’anshan, 243032, China

    Tao Wang & Meng Li

  4. Anhui Province Engineering Laboratory of Intelligent Demolition Equipment, Ma’anshan, 243032, China

    Tao Wang

  5. Wuhu Technology and Innovation Research Institute, AHUT, Wuhu, 241002, China

    Liping Shi

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  1. Tao Wang
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  2. Xin Wang
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  3. Jiahao Wang
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Correspondence to Liping Shi.

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Wang, T., Wang, X., Wang, J. et al. Investigation on Localized Etching Behaviors of Polymer Film by Atmospheric Pressure Plasma Jets. Plasma Chem Plasma Process 43, 679–696 (2023). https://doi.org/10.1007/s11090-023-10315-0

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  • DOI: https://doi.org/10.1007/s11090-023-10315-0

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