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Theoretical Kinetics Investigation of Krypton Dielectric Barrier Discharge for UV Lamp

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Abstract

This work presents an electric and kinetic study of homogeneous dielectric barrier discharge (DBD) in pure krypton (Kr). The electrical characterization and kinetic analyses of the DBD in Kr are performed. The plasma formation in DBD, excited by sinusoidal voltage at high pressure, was studied. The discharge development, with homogeneous model approach and using extended kinetic scheme, is simulated. The study is based on a spatial homogeneity model including the plasma chemistry, the electrical circuit and the Boltzmann equations’. The temporal variations of discharge voltage, dielectrics voltage, discharge current, electric field and species concentrations are calculated. The plasma kinetics is discussed with the aim to finding the optimal efficiency. The photon generation, under typical operating conditions, was investigated and discussed. The effect of some parameters on the excilamp like pressure, applied voltage, and frequency are investigated in order to identify the optimal parameters for maximum luminous efficiency in the UV range.

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Authors and Affiliations

  1. LPPMCA Laboratory of Plasma Physics, Conductive Materials and Their Applications, University of Science and Technology of Oran Mohamed Boudiaf, 31000, Oran, Algeria

    W. Benstâali, N. Larbi Daho Bachir, S. Bendella, A. Belasri & Z. Harrache

  2. Faculty of Sciences and Technology, Abdel Hamid Ibn Badiss University, B. P. 227, Route de Belhacel, 27000, Mostaganem, Algeria

    W. Benstâali

  3. Institut des Sciences et Techniques Appliquées, Université d’Oran, 1 Ahmed Benn Bella, 31000, Oran, Algeria

    N. Larbi Daho Bachir

  4. DPHE, University of Toulouse, Champollion National University Institute, Place de Verdun, 81012, Albi Cedex 9, France

    B. Caillier

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  1. W. Benstâali
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Correspondence to Z. Harrache.

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Benstâali, W., Larbi Daho Bachir, N., Bendella, S. et al. Theoretical Kinetics Investigation of Krypton Dielectric Barrier Discharge for UV Lamp. Plasma Chem Plasma Process 40, 1585–1603 (2020). https://doi.org/10.1007/s11090-020-10110-1

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