Abstract
Herein, we present a simple method for fabricating plasma polymerized hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge. The pp-HMDSO films were deposited on a soda–lime–silica float glass using HMDSO monomer vapor as a precursor. A detailed surface characterization was performed using scanning electron microscopy and atomic force microscopy. The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s. The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphological characteristics, as obtained from microscopy measurements. The deposited films were found to be nano-structured and exhibited dual-scale roughness with the static CA values close to 170°. Fourier transform infrared spectroscopy analysis was carried out to investigate chemical and functional properties of these films. Methyl groups were identified spectroscopically to be present within the pp-HMDSO films and were proposed to result in the low surface energy of material. The synergy between the dual-scale roughness and low surface energy resulted in the superhydrophobic characteristics of the pp-HMDSO films. A possible mechanism for the pp-HMDSO film formation is proposed.
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This work was funded by the European Social Fund and Republic of Lithuania (Project VP1-3.1-ŠMM-10-V-02-013). Support of the Research Council of Lithuania is gratefully acknowledged.
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Lazauskas, A., Baltrusaitis, J., Grigaliūnas, V. et al. Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge. Plasma Chem Plasma Process 34, 271–285 (2014). https://doi.org/10.1007/s11090-013-9516-y
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DOI: https://doi.org/10.1007/s11090-013-9516-y