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Role of Plasma Parameters on the Conjugated Structure Retention in Polyaniline Thin Film

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Abstract

The role of plasma parameters on the film characteristics is investigated on polyaniline thin film deposited by radio frequency (RF) plasma polymerization. A series of un-doped and iodine doped polyaniline thin films are prepared by RF discharge operating at 13.56 MHz with different discharge powers and pressure variation from 0.1 to 0.05 mbar and variation in deposition time from 20 to 40 min. A good thin film is found with a power ranging from 9 W (−28 V self bias) to 20 W (−65 V self bias) at 0.1 mbar pressure which is confirmed by fourier transform infra-red spectroscopy showing the retention of aromatic rings. In addition, iodine doping is carried out with 9 W power and 0.1 mbar pressure. The characterization of process plasma is done using Langmuir probe diagnostics and optical emission spectroscopy. A correlation has been established between film characteristics and plasma properties investigated using optical emission spectroscopy and Langmuir probe analysis. Emphasis has been given on the study of the influence of plasma parameters, particularly of the electron energy distribution function on the quality of conjugated plasma polymerized aniline film.

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Acknowledgments

We gratefully acknowledge the financial support from the BRNS-DAE, Government of India (Grant No. 2009/34/45/BRNS/3327). We thank IIT-Guwahati and Tezpur University for providing the sample characterization facility.

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Authors and Affiliations

  1. Physical Science Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Garchuk, Guwahati, 781035, India

    Amreen A. Hussain, Shyamalima Sharma, Arup R. Pal, Heremba Bailung & Joyanti Chutia

  2. Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai, 400 085, India

    Dinkar S. Patil

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  1. Amreen A. Hussain
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  2. Shyamalima Sharma
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  3. Arup R. Pal
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  4. Heremba Bailung
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  5. Joyanti Chutia
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Correspondence to Arup R. Pal.

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Hussain, A.A., Sharma, S., Pal, A.R. et al. Role of Plasma Parameters on the Conjugated Structure Retention in Polyaniline Thin Film. Plasma Chem Plasma Process 32, 817–832 (2012). https://doi.org/10.1007/s11090-012-9381-0

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