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Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films

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Abstract

We study the interaction of thick films (~4 mm) of stearic acid (SA), a C18 alkane skeleton with an acid function, with late Ar–O2 post-discharge. Contrary to what is observed with thin films of SA (~2–3 μm) which are efficiently etched (part I), only functionalization is observed over the first 2 h of treatment with a plasma source operated in the continuous mode, whatever the temperature. The heat released by surface reactions affects non-linearly the temperature of the substrate. Pulsing the source at a frequency ranging from 0.1 to 1 kHz slows down the functionalization process but does not allow any etching of the material. On the contrary, the SA can be etched as thick films by pulsing the oxygen flow rate at a frequency below 50 mHz. By pulsing the reactive gas, the time averaged value of the [O]/[O2] ratio is decreased, limiting the functionalization processes due to oxygen atoms, and the mean temperature is lowered, decreasing the diffusion length of O2 (and/or possibly O2*) species in the SA which are responsible for the scission of C–C bonds of radicals.

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Acknowledgments

The authors thank the CAPES/COFECUB, a joint Brazilian/French project (Ph 697/10), for support. These Researches were carried out within the framework of the Associated European Laboratory: «Laboratoire d’Interaction Plasma—Extrême Surface (LIPES)».

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Authors and Affiliations

  1. Institut Jean Lamour, Department of Physics and Chemistry of Solids and Surfaces, Nancy-Université, CNRS, Parc de Saurupt, CS 14234, 54042, Nancy Cedex, France

    E. A. Bernardelli, T. Belmonte & C. Noël

  2. Laboratório de Materiais, Departamento de Engenharia Mecânica, Universidade Federal de Santa Catarina, 88040–900, Florianópolis, SC, Brasil

    E. A. Bernardelli & A. Maliska

  3. Centre de Recherche Public Gabriel Lippmann, 41, rue du Brill, 4422, Belvaux, Luxembourg

    D. Duday, G. Frache, P. Choquet & H.-N. Migeon

  4. Laboratoire Polymères Colloïdes Interfaces, UMR CNRS 6120, Université du Maine, Avenue O Messiaen, 72085, Le Mans, France

    F. Poncin-Epaillard

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  1. E. A. Bernardelli
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  2. T. Belmonte
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  4. G. Frache
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  5. F. Poncin-Epaillard
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  6. C. Noël
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  9. A. Maliska
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Correspondence to T. Belmonte.

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Bernardelli, E.A., Belmonte, T., Duday, D. et al. Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films. Plasma Chem Plasma Process 31, 205–215 (2011). https://doi.org/10.1007/s11090-010-9264-1

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  • DOI: https://doi.org/10.1007/s11090-010-9264-1

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