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Preparation of Self-Healing α-Al2O3 Films by Low Temperature Thermal Oxidation

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Abstract

This paper reports a new approach to lowering the temperature necessary for the preparation of α-Al2O3. Oxidation of Al–Cr alloys, with Cr contents of 18, 23 and 27 %, was performed at temperatures ranging from 620 to 720 °C in air for 100 h. The resulting oxide films were analyzed by SEM, EDS, XRD and XPS. The results showed that α-Al2O3 films were obtained following oxidation of the 18 and 23 wt% Cr alloy samples at 720 °C and that rough surfaces were conducive to the formation of α-Al2O3 such that peened surface samples showed significant α-Al2O3 growth while polished samples showed no oxide by XRD. A 23 wt% Cr sample with a roughened surface exhibited the formation of α-Al2O3 at a temperature of 670 °C. Conversely, only a very thin oxide film was observed on a 27 wt% Cr sample after oxidation at 720 °C.

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Acknowledgments

This research was supported by the Open Foundation of Key Laboratory for Science and Technology on Surface Physics and Chemistry, China (Grant No. SPC201101).

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Authors and Affiliations

  1. Department of Materials Science and Engineering, Zhejiang University, Hangzhou, China

    Jun Cai, Yan Li, Jin-ming Wu & Guo-ping Ling

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  1. Jun Cai
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  2. Yan Li
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  3. Jin-ming Wu
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Correspondence to Guo-ping Ling.

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Cai, J., Li, Y., Wu, Jm. et al. Preparation of Self-Healing α-Al2O3 Films by Low Temperature Thermal Oxidation. Oxid Met 81, 253–265 (2014). https://doi.org/10.1007/s11085-013-9411-1

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  • DOI: https://doi.org/10.1007/s11085-013-9411-1

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