Abstract
Pulsed laser deposition (PLD) is a commonly utilized technology for growing thin films in academia and industry. Compared to alternative deposition processes, the PLD offers more excellent benefits such as adaptability, control over the growth rate, stoichiometric transfer, and an infinite degree of freedom in the ablation geometry. This investigation collected data from five reputable academic databases, including Science Direct, IEEE Xplore, Scopus, Web of Science, and Google Scholar. In this review, we analyzed and summarized 20 empiricals on the impact of pulsed laser deposition on the production nanostructure, including laser wavelength, laser fluence, repetition rate and pulse length of the laser pulse, pulse shaping of the laser spot, plasma generation, distance between substrates and target, angular position of the material, substrate temperature, gas composition, and target material properties. Finally, we show this field's advantages, challenges, and viewpoints and focus on the strengths and weaknesses that can improve the deposition of nanostructure properties for various applications. Therefore, provide fascinating insights into the interaction of these processes in different fields.
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Abbreviations
- LPCVD:
-
Low-pressure chemical vapor deposition
- PECVD:
-
Plasma enhanced chemical vapor deposition
- ALD:
-
Atomic layer deposition
- PLD:
-
Pulsed laser deposition
- CHAP:
-
Carbonated hydroxyapatite
- MBE:
-
Molecular beam epitaxy
- CVD:
-
Chemical vapor deposition
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The authors gratefully acknowledge the financial and technical support provided by the Applied Sciences Department, university of technology, Baghdad, Iraq, and Al-Ayen University, Thi-Qar, Iraq.
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A.J.H. and B.A.T, Conceptualization and methodology, M.J.H., wrote the initial manuscript draft. With the support of T.A. and H.A.M., all authors have reviewed and accepted the published version of the manuscript.
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Haider, A.J., Alawsi, T., Haider, M.J. et al. A comprehensive review on pulsed laser deposition technique to effective nanostructure production: trends and challenges. Opt Quant Electron 54, 488 (2022). https://doi.org/10.1007/s11082-022-03786-6
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DOI: https://doi.org/10.1007/s11082-022-03786-6