Abstract
InSb infrared focal plane arrays (IRFPAs) detector, active in 3–5 μm range, has been widely used in military fields. In the fabrication of InSb IRFPAs, the InSb chip is usually thinned down to 10 μm by means of both the chemical mechanical polishing (CMP) process and the wet chemical etching process. In order to confirm the operation limitation of the CMP process, in light of the proposed equivalent method, we create the deformation analysis modeling of InSb IRFPAs. In order to learn the evolving tendency of the deformation distribution characteristic appearing on the top surface of InSb IRFPAs during the thinning process of InSb chip, we reduce the thickness of InSb chip from 300 μm down to 6 μm in a suitable step. And the simulated Z-components of strain distribution are identical with the measured deformation distribution, appearing on the top surface of InSb IRFPAs with different InSb chip thickness values. According to the dependence of the deformation distribution characteristic of InSb IRFPAs on the thickness of InSb chip, we conclude that the thickness of InSb chip should not be thinner than 30 μm after the CMP process is executed completely. A series of thickness values of GaSb substrate, which is thinned down to 60, 50 or 30–40 μm by CMP process in the fabrication of type-IIsuperlattice IRPFAs, support our conclusion. All these cases prove that the operation limitation of the CMP process proposed in this paper is accurate and acceptable in the fabrication of IRFPAs.
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The research was supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 61505048) and by the Aero Science Foundation of China (Grant No. 20152442001).
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Meng, Q., Zhang, X., Lü, Y. et al. Operation limitation of CMP in back-thinning process of InSb IRFPAs. Opt Quant Electron 49, 211 (2017). https://doi.org/10.1007/s11082-017-1056-x
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DOI: https://doi.org/10.1007/s11082-017-1056-x