Abstract
Vanadium oxidation method is a promising approach for industrial production of VO2 thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO2 thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO2 films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO2 film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.
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This work was partially supported by the Shanghai Science and Technology Foundations (15DZ2282100, 16DZ2290600), Youth Innovation Promotion Association CAS (2012189).
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Liu, X., Ji, R., Zhang, Y. et al. Annealing process and mechanism of glass based VO2 film from V oxidation in pure oxygen atmosphere. Opt Quant Electron 48, 453 (2016). https://doi.org/10.1007/s11082-016-0720-x
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DOI: https://doi.org/10.1007/s11082-016-0720-x