Abstract
The scaling-down of phase change memory cell is critical to achieve high-performance and high-density memory devices. Herein, we report that Ge2Sb2Te5 nanoparticles along the [1 1 1] direction were synthesized without templates or etching in a molecular beam epitaxy system. Under non-stoichiometric Ge:Sb:Te beam ratio condition, the growth of high-density Ge2Sb2Te5 nanoparticles was achieved by Zn-doping. The average diameter of the nanoparticles is 8 nm, and the full width at half maximum of the size distribution is 2.7 nm. Our results suggest that the size and shape modifications of Ge2Sb2Te5 nanoparticles could be induced by Zn-doping which influences the nucleation in the growth process. In addition, the bonding states of Zn and Te verified by X-ray photoelectron spectroscopy proved that Zn atoms located in the Ge2Sb2Te5 matrix. This approach exemplified here can be applied to the sub-20 nm phase change memory devices and may also be extendable to be served in the design and development of more materials with phase transitions.
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This study was funded by the National Natural Science Foundation of China (Grants 21427802, 21131002, and 21201075).
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Zheng, B., Sun, Y., Wu, J. et al. Molecular beam epitaxial growth of oriented and uniform Ge2Sb2Te5 nanoparticles with compact dimensions. J Nanopart Res 19, 50 (2017). https://doi.org/10.1007/s11051-017-3759-0
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DOI: https://doi.org/10.1007/s11051-017-3759-0