Abstract
The Au nanoparticle monolayer is formed by self-assembly technology on the Si substrates terminated with different functional groups. Silicon nanotips were fabricated by a self-assembled gold colloidal particle monolayer as an etch mask. The silicon nanotips with high density and uniformity in height and shape were obtained using reactive ion etching (RIE). The Si nanotips on the surface of the 3-aminopropyltrimethoxysilane (APTMS)-treated Si substrate are less-ordered array and uniformity than 3-mercaptopropyltrimethoxysilane (MPTMS)-treated Si substrate at the same etching conditions. The ordered array and uniformity of Si nanotips on the APTMS-modified Si substrate was improved through heat-treatment. This result is implied the different functional groups on the Si surfaces could affect the formation of the Si nanostructures during RIE process. The uniformly nanotip pattern with height of >20 nm is obtained on the etched nanoparticle-coated Si substrate. This method can be applied to patterning a wide variety of thin film materials into tip arrays.
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References
Bao Z, Chen L, Weldon M, Chandross E, Cherniavskaya O, Dai Y, Tok JBH (2002) Toward controllable self-assembly of microstructures: selective functionalization and fabrication of patterned spheres. Chem Mater 14:24–26
Bhatta UM, Dash JK, Roy A, Rath A, Satyam PV (2009) Formation of aligned nanosilicide structures in a MBE-grown Au/Si(110) system: a real-time temperature-dependent TEM study. J Phys Condens Matter 21:205403
Geissler M, Xia Y (2004) Patterning: principles and some new developments. Adv Mater 16:1249–1269
Glass R, Moller M, Spatz JP (2003) Block copolymer micelle nanolithography. Nanotechnology 14:1153–1160
Glass R, Arnold M, Adam EAC, Blumel J, Haferkemper C, Dodd C, Spatz JP (2004) Block copolymer micelle nanolithography on non-conductive substrates. New J Phys 6:1–17
Gowrishankar V, Miller N, McGehee MD, Misner MJ, Ryu DY, Russell TP, Drockenmuller E, Hawker CJ (2006) Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography. Thin Solid Films 513:289–294
Hong YK, Bahng JH, Lee G, Kim H, Kim W, Lee S, Koo JY, Park JI, Lee W, Cheon J (2003) Facile fabrication of 2-dimensional arrays of sub-10 nm single crystalline Si nanopillars using nanoparticle masks. Chem Commun 3034–3035
Huang X, Huang H, Wu N, Hu R, Zhu T, Liu Z (2000) Investigation of structure and chemical states of self-assembled Au nanoscale particles by angle-resolved X-ray photoelectron spectroscopy. Surf Sci 459:183–190
Huang S, Tsutsui G, Sakaue H, Shingubara S, Takahagi T (2001) Experimental conditions for a highly ordered monolayer of gold nanoparticles fabricated by the Langmuir–Blodgett method. J Vac Sci Technol B 19:2045–2049
Koslowski B, Strobel S, Herzog T, Heinz B, Boyen HG, Notz R, Ziemann P, Spatz JP, Moller M (2000) Fabrication of regularly arranged nanocolumns on diamond (100) using micellar masks. J Appl Phys 87:7533–7538
Lewis PA, Ahmed H, Sato T (1998) Silicon nanopillars formed with gold colloidal particle masking. J Vac Sci Technol B 16(6):2938–2941
Liu S, Zhu F, Hu R, Liu Z (2002) Evaporation-induced self-assembly of gold nanoparticles into a highly organized two-dimensional array. Phys Chem Chem Phys 4:6059–6062
Meli MV, Lennox RB (2003) Preparation of nanoscale Au islands in patterned arrays. Langmuir 19:9097–9100
Sato T, Ahmed H, Brown D, Johnson BFG (1997a) Single electron transistor using a molecularly linked gold colloidal particle chain. J Appl Phys 82(2):696–701
Sato T, Brown D, Johnson BFG (1997b) Nucleation and growth of nano-gold colloidal lattices. Chem Commun 100:7–1008
Schrefl T, Hrkac G, Suess D, Scholz W, Fidler J (2003) Coercivity and remanence in self-assembled FePt nanoparticle arrays. J Appl Phys 93:7041–7044
Stowell C, Korgel BA (2001) Self-assembled honeycomb networks of gold nanocrystals. Nano Letters 1:595–600
Sun S, Murray CB (1999) Synthesis of monodisperse cobalt nanocrystals and their assembly into magnetic superlattices. J Appl Phys 85:4325–4330
Tripp SL, Pusztay SV, Ribbe AE, Wei A (2002) Self-assembly of cobalt nanoparticle rings. J Am Chem Soc 124:7914–7915
Tsutsui G, Huang S, Sakaue H, Shingubara S, Takahagi T (2001) Well-size-controlled colloidal gold nanoparticles dispersed in organic solvents. Jpn J Appl Phys 40:346–349
Whang D, Jin S, Lieber CM (2003) Nanolithography using hierarchically assembled nanowire masks. Nano Lett 3:951–954
Xia Y, Whitesides GM (1998) Soft lithography. Angew Chem Int Ed 37:550–575
Xiong X, Busnaina A (2008) Direct assembly of nanoparticles for large-scale fabrication of nanodevices and structures. J Nanopart Res 10:947–954
Yang SM, Jang SG, Choi DG, Kim S, Yu HK (2006) Nanomachining by colloidal lithography. Small 2(4):458–475
Zhou WL, He J, Fang J, Huynh T, Kennedy TJ, Stokes KL, Oconnor CJ (2003) Self-assembly of FePt nanoparticles into nanorings. J Appl Phys 93:7340–7342
Zhukow AA, Ghanem MA, Goncharov AV, de Groot PAJ, El-Hallag IS, Bartlett PN, Boardman R, Fangohr H (2003) Coercivity of 3D nanoscale magnetic arrays from self-assembly template methods. J Magn Magn Mater 272–276:1621–1622
Acknowledgments
The authors would like to thank the Instrumental analysis center of Shanghai Jiaotong University for that help with the SEM and AFM measurements. This study is supported by National Natural Science Foundation of China No. 50730008, Shanghai Science and Technology Grant No: 0752nm015, and National Basic Research Program of China No. 2006CB300406, National Science Foundation of Shanghai, China (Grant No. 06ZR14047).
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Wang, Y., Zhu, L., Zhang, Y. et al. Silicon nanotips formed by self-assembled Au nanoparticle mask. J Nanopart Res 12, 1821–1828 (2010). https://doi.org/10.1007/s11051-009-9741-8
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DOI: https://doi.org/10.1007/s11051-009-9741-8