Abstract
The design and operation of a new UHV-compatible atomic cluster deposition system is described. The design is optimised for high cluster fluxes and for the production of cluster-assembled nano-devices. One key feature of the system is a high degree of flexibility, including interchangeable sputtering and inert gas aggregation sources, and two kinds of mass spectrometer, which allow both characterisation of the cluster size distribution and deposition of mass-selected clusters. Another key feature is that clusters are deposited onto electrically contacted lithographically defined devices mounted on an UHV-compatible cryostat cold finger, allowing deposition at room temperature as well as cryogenic and elevated temperatures. In-situ electrical characterisation of cluster-assembled devices can then be performed in the temperature range 1.2--75 K.
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Acknowledgments
The authors would like to thank Prof. Dr. Hellmut Haberland and PD Dr. Bernd v. Issendorff for their collaboration and helpful discussions regarding the magnetron sputter source. Additional thanks also to our technicians without whose help the construction of this system would not have been possible.
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Reichel, R., Partridge, J.G., Dunbar, A.D. et al. Construction and Application of a UHV Compatible Cluster Deposition System. J Nanopart Res 8, 405–416 (2006). https://doi.org/10.1007/s11051-005-9021-1
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DOI: https://doi.org/10.1007/s11051-005-9021-1