The outlook for interferometric measurements in the analysis of nanotechnology products and processes owing to advances in the development of methods and means for measuring the parameters of wave fronts is discussed. A high degree of automation, as well as newly developed methods for processing and interpreting interferograms, have led to axial resolutions of up to 0.1 nm, essentially in real time.
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Translated from Izmeritel’naya Tekhnika, No. 7, pp. 24–26, July, 2012.
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Zolotarevskiy, Y.M., Levin, G.G. Interference measurements in nanotechnologies. Meas Tech 55, 770–772 (2012). https://doi.org/10.1007/s11018-012-0036-6
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DOI: https://doi.org/10.1007/s11018-012-0036-6