Abstract
Polyimide films with low dielectric properties and high thermal stability have been widely used in advanced integrate circuit industry. Herein, this article briefly summarized the recent achievements in reducing the dielectric properties of polyimide films via a variety of methods or strategies, and the mechanical properties, thermal stability or optical properties were also summarized. Achieving the synergy of low dielectric properties, high thermal stability and superior mechanical properties is the research directions and priories of future development for polyimide films.
Graphical Abstract
Highlights
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Reducing the molecular polarizability and enhancing the fractional free volume are the main strategies to decrease k of PI films.
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Introducing porous structures is the most efficient approach to decrease the k of PI films.
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Achieving the synergy of low k, high thermal stability and superior mechanical properties are the research priories for PI films.
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Abbreviations
- PI:
-
Polyimide
- PAA:
-
Polyamide acid
- k:
-
Dielectric constant
- DF:
-
Dielectric loss
- TG:
-
Glass transition temperature
- FFV:
-
Fractional free volume
- T450:
-
Transmittance at 450 nm
- CET:
-
Coefficient of linear thermal expansion
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Acknowledgements
This research was financially supported by the National Natural Science Foundation of China (Project No. 52202079), Shenzhen Science and Technology Innovation Committee (JSGGZD20220822095400002, JCYJ20200109141808025, JSGG20210629144802007) and Post-doctoral Later-stage Foundation Project of Shenzhen Polytechnic (6023271013K,6021271003K), and the Start-up Scientific Research Foundation Project of Shenzhen Polytechnic (6023312048K).
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Zhang, D., Li, L., Wang, Y. et al. Methods and strategies to decrease the dielectric properties of polyimide films: a review. J Sol-Gel Sci Technol 108, 1–12 (2023). https://doi.org/10.1007/s10971-023-06143-5
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DOI: https://doi.org/10.1007/s10971-023-06143-5