Abstract
Silica films were grown on polyimide substrate using surface sol–gel reaction, and the film growth process was characterized by ellipsometry, atomic force microscopy, and X-ray photoelectron spectroscopy. On the activated polyimide surface, silica film was grown by sequential immersion in SiCl4 solution and H2O. The thickness of silica films is linear with the depositing cycle, about 5.0 nm per cycle. The silica films present an island-like growth type and are not a strict equilibrium SiO2 structure. Moreover, the result of the tensile test suggests that the silica films have a good adhesion to the polyimide substrate.
Similar content being viewed by others
References
Marshall JM, Kirov N, Vavrek A (1994) Electronic, optoelectronic and magnetic thin films. Wiley, New York
Wu YY, Li BS, Wang CQ (2005) Equip Electron Prod Manuf 125:6–17
Kovtyukhova NI, Buzaneva EV, Waraksa CC et al (2000) Chem Mater 12:383–389
Ichinose I, Senzu H, Kunitake T (1996) Chem Lett 25:831–834
Ichinose I, Senzu H, Kunitake T (1997) Chem Mater 9:1296–1298
Nicolau YF, Menard JC (1992) Colloids Surf 63:83–92
Takaki R, Takemoto H, Fujikawa S et al (2008) Colloids Surf A Physicochem Eng Aspects 321:227–232
Yan W, Mahurin SM, Overbury SH et al (2005) Chem Mater 17:1923–1925
Yan W, Chen B, Mahurin SM et al (2004) J Phys Chem B 108:2793–2796
Houng MP, Huang CJ, Wang YH et al (1997) J Appl Phys 82:5788–5792
Huang CJ, Houng MP, Wang YH et al (1999) J Appl Phys 86:7151–7155
Fang M, Kim CH, Martin BR et al (1999) J Nanopart Res 1:43–49
Gong YP, Li AD, Zhao C et al (2010) Microelectron Eng 87:1756–1759
Zhang X, Wu YY, He SY (2010) Hebei J Ind Sci Technol 27:149–152
Seah MP, Dench WA (1979) Surf Interface Anal 1:2–11
Wagner CD, Naumkin AV, Kraut-Vass A et al NIST Standard Reference Database 20, Version 3.4 (Web Version)
Mirley CL, Koberstein JT (1995) Langmuir 11:1049–1052
Takeda S, Fukawa M, Hayashi Y et al (1999) Thin Solid Films 339:220–224
Stec WJ, Morgan WE, Albridge RG et al (1972) Inorg Chem 11:219–225
Andersons J, Leterrier Y, Tornare G et al (2007) Mech Mater 39:834–844
Kozuka H, Takenaka S, Tokita H et al (2003) J Sol-Gel Sci Technol 26:681–686
Li HB, Sharma RK, Zhang Y et al (2003) Langmuir 19:6845–6850
Teshima K, Inoue Y, Sugimura H et al (2002) Thin Solid Films 420/421:324–329
Erlat AG, Spontak RJ (1999) J Phys Chem B 103:6047–6055
Kim D, Shen YR (1999) Appl Phys Lett 74:3314–3316
Stoffel NC, Hsieh M, Chandra S et al (1996) Chem Mater 8:1035–1041
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Zhang, X., Mao, L. & Ma, J. Surface sol–gel synthesis of silica films on polyimide substrate. J Sol-Gel Sci Technol 61, 34–38 (2012). https://doi.org/10.1007/s10971-011-2586-5
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10971-011-2586-5