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Photo-curable organically modified silicate-phosphate alternating copolymer for photonics applications

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Abstract

Photo-curable vinyl modified silicate-phosphate alternating copolymers were prepared by a direct condensation of organochlorosilane and organophosphoric acid in a solvent-free condition. The obtained copolymers have complete alternating copolymer structure of silicate and phosphate unit, where the main oxo chain consist of –(Si–O–P–O) n -network. They exhibited an excellent solubility of ionic species such as ionic organic dyes. It was also demonstrated the photo-reduction of Au+ ions to form Au nano particles for plasmonics applications. Micro patterns were also fabricated by soft lithographic processes. These results indicate that the photo-curable alternating copolymers are one of promising materials for advanced optical information processing devices.

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Acknowledgments

The present work was partially supported by Grant-in-Aid for Scientific Research on Priority Areas of Strong Photon-Molecule Coupling Fields (No. 470) from MEXT, Japan.

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Authors and Affiliations

  1. Department of Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka, 599-8531, Japan

    Masahide Takahashi & Rie Ihara

  2. Institute for Chemical Research, Kyoto University, Uji, Kyoto, 611-0011, Japan

    Masahide Takahashi, Masaru Suzuki, Yuya Miyagawa, Rie Ihara, Yomei Tokuda, Toshinobu Yoko, Takashi Nemoto & Seiji Isoda

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  1. Masahide Takahashi
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  2. Masaru Suzuki
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  3. Yuya Miyagawa
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  4. Rie Ihara
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  5. Yomei Tokuda
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  6. Toshinobu Yoko
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  7. Takashi Nemoto
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  8. Seiji Isoda
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Correspondence to Masahide Takahashi.

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Takahashi, M., Suzuki, M., Miyagawa, Y. et al. Photo-curable organically modified silicate-phosphate alternating copolymer for photonics applications. J Sol-Gel Sci Technol 54, 319–324 (2010). https://doi.org/10.1007/s10971-010-2197-6

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  • DOI: https://doi.org/10.1007/s10971-010-2197-6

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