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Antiferromagnetic and Ferromagnetic Interactions from Thin Films of FeNi

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Abstract

Thin films of Ni, FeNi/Cu/FeNi, and FeNi were obtained via electrodeposition, and their remanence magnetic properties were studied using isothermal remanent magnetization (IRM) and direct current demagnetization (DCD). The effects of a dipolar field on the shape of the hysteresis loop for thin films of Ni and FeNi were presented. A dipolar interaction field was obtained for the IRM and DCD remanence curves for the thin films. We studied the magnetic interactions using the ΔM plot for thin films of Ni, FeNi/Cu/FeNi, and FeNi. The ΔM plots show ferromagnetic and antiferromagnetic interactions in the Ni thin films. While that for the FeNi thin films, the ΔM plots show a system where antiferromagnetic interactions exist. A mathematical model was used that characterizes the effects of the interaction field for the thin films of FeNi.

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Acknowledgements

J. L. Hidalgo-González thanks the Instituto Tecnológico Superior de Huichapan for the help in advancing the research project.

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  1. Instituto Tecnológico Superior de Huichapan, El Saucillo, 42411, Huichapan, Hidalgo, México

    Juan José de Jesús Hernández Cruz & José Luis Hidalgo González

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  1. Juan José de Jesús Hernández Cruz
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  2. José Luis Hidalgo González
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Correspondence to José Luis Hidalgo González.

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de Jesús Hernández Cruz, J.J., González, J.L.H. Antiferromagnetic and Ferromagnetic Interactions from Thin Films of FeNi. J Supercond Nov Magn 35, 2015–2019 (2022). https://doi.org/10.1007/s10948-022-06265-x

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