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Speckle Interferometric Investigation of Argon Pressure-Induced Surface Roughness Modifications in RF-Sputtered MoO3 Film

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Abstract

Film quality analysis is of more considerable significance due to its diversified applications in various fields of technology. The present work reports the speckle interferometric analysis of the argon pressure-induced surface roughness modifications of RF sputtered MoO3 films. The paper suggests a new method of surface quality analysis of thin films through a parameter δ, which is the difference between the initial and final inertia moment values in the study of the thermal-induced dynamic speckle pattern. The limitations of root mean square surface roughness analysis of the atomic force microscopic image of the films is also exemplified. The research suggests that argon pressure plays a vital role in the surface property of RF sputtered films and also that the dynamic speckle analysis can give precise information about the quality of films. The contour plot of particle displacement vector under thermal stress, suggests the degree of uniformity in the distribution of particles in the film.

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Authors and Affiliations

  1. Department of Optoelectronics, University of Kerala, Kariavattom, Thiruvananthapuram, Kerala, 695581, India

    S. Soumya, S. Sreejyothi, Vimal Raj, M. S. Swapna & S. Sankararaman

  2. Department of Electrical Engineering, Indian Institute of Technology, Palakkad, Kerala, 678623, India

    R. Arun Kumar

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  1. S. Soumya
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  2. R. Arun Kumar
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  3. S. Sreejyothi
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  5. M. S. Swapna
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Correspondence to S. Sankararaman.

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Soumya, S., Kumar, R.A., Sreejyothi, S. et al. Speckle Interferometric Investigation of Argon Pressure-Induced Surface Roughness Modifications in RF-Sputtered MoO3 Film. J Nondestruct Eval 40, 10 (2021). https://doi.org/10.1007/s10921-020-00741-x

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