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Growth of magnetic graphene films with higher electromagnetic interference shielding at moderate annealing temperatures

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Abstract

Ultrathin, highly conductive, and free-standing graphene films have been seen as promising electromagnetic interference (EMI) shielding materials for portable electronic devices. However, they are still expensive. In this paper, a magnetic graphene film decorated with Fe3O4 nanoparticles was prepared through in situ wet chemical synthesis followed by catalytic graphitization. A graphitic structure was obtained at a moderate annealing temperature (1000 °C), after introducing Fe3O4 nanoparticles. This temperature is much lower than the conventional graphitization temperature, which reduces the synthesis costs of graphene film. In addition, Fe3O4 also behaved as microwave absorbers, enhancing the EMI shielding performances. The resulting ultrathin film (~ 50 μm) provided a high EMI shielding effectiveness (SE) of ~ 52.76 dB in the X-band (8.2-12.4 GHz). This is found to be higher than that of bare graphene films (~ 33.45 dB) prepared under the same temperature and sufficient to screen about 99.999% of microwave radiation. Furthermore, absorption was the dominant shielding mechanism for the prepared film owing to the contribution of Fe3O4 nanoparticles that reduced the electromagnetic pollution resulting from secondary reflections. The catalytic graphitization strategy could provide a low-cost approach for fabricating efficient graphene-based EMI shielding materials for portable electronic device applications.

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Data availability

All data generated or analyzed during the current study are available from the corresponding author on reasonable request.

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Acknowledgements

This work was supported by the Youth Science Foundation of Shanxi Province (201901D211576 and 202103021223453) and General Projects of Natural Science Research of Shanxi Province (202103021224448).

Funding

Youth Science Foundation of Shanxi Province, 201901D211576, Wei Liu, 202103021223453, Kun Jia, General Projects of Natural Science Research of Shanxi Province, 202103021224448, Wei Liu.

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Authors and Affiliations

  1. College of Chemistry and Chemical Engineering, Shanxi University, Taiyuan, 030006, China

    Wei Liu & Xuehong Wei

  2. College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China

    Wei Liu

  3. Shanxi Key Laboratory of Electromagnetic Protection Materials and Technology, 33rd Research Institute of China Electronics Technology Group Corporation, Taiyuan, 030006, China

    Wei Liu, Kun Jia, Donghong Wang, Peng Wang & Kai Zheng

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  1. Wei Liu
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Contributions

WL did methodology, investigation, formal analysis, data curation, writing—original draft, and funding acquisition. KJ was involved om validation, formal analysis, and funding acquisition. DW performed formal analysis, writing—review and editing. XW contributed to conceptualization, methodology, writing—review & editing. PW done writing—review and editing. KZ performed resources and writing—review and editing.

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Correspondence to Xuehong Wei.

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Liu, W., Jia, K., Wang, D. et al. Growth of magnetic graphene films with higher electromagnetic interference shielding at moderate annealing temperatures. J Mater Sci: Mater Electron 33, 23781–23791 (2022). https://doi.org/10.1007/s10854-022-09136-2

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