Abstract
Heterogeneous interfaces are of particular interest for developing highly efficient microwave absorbing materials. In this work, nanocarbon layer was in situ grown on the surface of Ni particles by plasma-enhanced chemical vapor deposition (PECVD), which created heterogeneous interfaces between nanocarbon materials and Ni particles via physical interactions. The defects of nanocarbon layer could be controlled by changing the mixture of reaction gas, resulting in tunable permittivity. Significant enhancement of microwave absorbing performance was obtained for the nanocarbon-coated Ni composites due to the enhanced impedance matching and polarization relaxations. The percentage bandwidths with reflection loss ≤ − 10 dB for the nanocarbon-coated composites were considerably larger than that for the original composite at any specified thickness in the range of 1.50 ∼ 5.00 mm. Quantitative loss analysis revealed that the energy dissipations of nanocarbon-coated composites originated from synergistic magnetic and dielectric losses, where dielectric loss was even predominate in high-frequency region. It is expected that the current method would provide an effective way for the optimal design of microwave absorbing materials.
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The data that support the findings of this study are available from the corresponding author upon reasonable request.
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Acknowledgements
This work was financially supported by the National Natural Science Foundation of China (No. 61901430) and the Science & Technology Innovation Fund of AVIC MTI (No. 911905144).
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All authors contributed to the study conception and design. Material preparation, data collection, and analysis were performed by LZ, LG, and MY. The first draft of the manuscript was written by LZ and all authors commented on previous versions of the manuscript. All authors read and approved the final manuscript.
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Zhou, L., Gao, L., Yang, M. et al. In situ growth of nanocarbon-coated Ni particles by PECVD for enhanced microwave absorption. J Mater Sci: Mater Electron 33, 16306–16319 (2022). https://doi.org/10.1007/s10854-022-08523-z
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DOI: https://doi.org/10.1007/s10854-022-08523-z