Abstract
In the present article, ion-beam lithography in ion-exchanged glasses is used as a method for the fabrication of miniaturized phase optical diffractive elements. It is established that, as a result of the interaction of a low-energy (∼ 40 keV) He+ ion beam with silver-ion-exchanged glasses, the index of refraction of interacted area increases. In the interacted areas of the samples, the formation of neutral silver nanoparticles leads to an increase in the index of refraction. This paves the way to employ such material to produce optical phase diffractive elements such as slits, gratings, or Fresnel’s zone plates. It is found that a remarkable dispersion for the index of refraction (n = n(λ)) gives rise to the dependence of diffraction efficiency of produced elements to the wavelength of the probe beams. The produced elements are of good quality, optically effective, chemically stable, waterproof, and scratch resistant.
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The data that support the findings of this study are available from the corresponding author upon reasonable request.
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Acknowledgements
Authors would like to thank Dr. Khosrow Hassani for his valuable discussions and advices, and also Dr. Abbas Saberi for his financial support of XRF measurements, both of them from Department of Physics of University of Tehran, Iran.
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Nahal, A., Hosseini, S.R. & Mahjour-Shafiei, M. Ion-beam lithography for fabrication of diffractive optical phase elements in silver-ion-exchanged glasses. J Mater Sci: Mater Electron 32, 23349–23362 (2021). https://doi.org/10.1007/s10854-021-06819-0
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DOI: https://doi.org/10.1007/s10854-021-06819-0