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Electromagnetic and microwave properties of NiFe/NiFeO multilayer thin films

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Abstract

In this work, [NiFe/NiFeO]10 multilayer thin films were fabricated by magnetron sputtering. The microwave and electromagnetic properties were investigated for different thicknesses, t, of the NiFeO layer (t = 0–6 nm) while the thickness of the NiFe was maintained at 8 nm in every cycle. A clear in-plane uniaxial anisotropy field was induced by an external magnetic field. The in-plane uniaxial anisotropy can be adjusted by tailoring the thickness of the NiFeO layer. When t = 0 nm, the NiFe monolayer, which has a thickness of 80 nm, showed low resistivity (ρ) and ferromagnetic resonance frequency (f r ). By increasing the t from 0 to 6 nm, the ρ of the [NiFe/NiFeO]10 films exhibited a significant monotonic increase (from 111.2 to 268.8 μΩ cm), the f r rose from 1.07 to 2.85 GHz, and the saturation magnetization (4πM s ) was decreased from 12.7 to 10.8 kG. The real part (μ′) of the complex permeability is larger than 100 in the range 0.2–1.9 GHz and the damping coefficient (α eff ) increases to 0.078 for t = 6 nm.

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Acknowledgments

We thank the Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education for providing the Vector Network Analyzer measurement. This work was supported by the Program for New Century Excellent Talents in University (No. MCET-11-1061).

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Authors and Affiliations

  1. State Key Laboratory Cultivation Base for Nonmetal Composites and Functional Materials, Southwest University of Science and Technology, Mianyang, 621010, China

    Jing Xu, Bo Dai, Yong Ren, Yubo Wang & Xiaohu Huang

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  1. Jing Xu
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  2. Bo Dai
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  3. Yong Ren
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  4. Yubo Wang
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  5. Xiaohu Huang
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Correspondence to Bo Dai.

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Xu, J., Dai, B., Ren, Y. et al. Electromagnetic and microwave properties of NiFe/NiFeO multilayer thin films. J Mater Sci: Mater Electron 26, 2931–2936 (2015). https://doi.org/10.1007/s10854-015-2779-8

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  • DOI: https://doi.org/10.1007/s10854-015-2779-8

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