Erratum to: Studies of electrical resistivity and magnetic properties of nanocrystalline CoFeCu thin films electrodeposited from citrate-added baths

Erratum to: J Mater Sci: Mater Electron DOI 10.1007/s10854-011-0568-6

Due to a miscalculation, there was a mistake in Fig. 5 of the original publication. The correct version of Fig. 5 should be as shown below.

Fig. 5

D ⁶-dependence of coercivity of CoFeCu thin films deposited from Table 1