Abstract
The character of dislocations at the emission sites observed in p–n diodes on (0001) GaN by emission microscopy under reverse biasing is investigated. The dislocation is a c-type threading dislocation formed by the reaction of c+a and -a dislocations. The c-type threading dislocation is closed-core, screw type, and helical, formed by vacancy desorption with a 0.2 μm cavity approximately 2 μm beneath the surface. The band-edge photoluminescence under multiphoton excitation at the dislocation in the p layer is brighter than that of the surrounding non-defective area.
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Acknowledgments
This study was partially supported by Japan Society for the Promotion of Science KAKENHI (Grant No. 20K05176). The authors are deeply grateful to Dr. S. Kobayashi for the insightful discussion on the contrast in the STEM images.
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YI: Conceptualization (lead); writing—original draft (lead); data curation (equal); investigation (equal); writing—review and editing (equal); funding acquisition (equal). YS: Investigation (equal); data curation (equal); writing—review and editing (equal). DY: Investigation (equal); writing—review and editing (equal). KS: Investigation (equal); writing—review and editing (equal). YY: Writing—review and editing (equal). KW: Investigation (equal); resources(equal); writing—review and editing (equal). TO: Conceptualization (equal); resources (lead); investigation (equal); writing—review and editing (equal); funding acquisition (lead).
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Ishikawa, Y., Sugawara, Y., Yokoe, D. et al. Characterization of dislocations at the emission site by emission microscopy in GaN p–n diodes. J Mater Sci 58, 9221–9232 (2023). https://doi.org/10.1007/s10853-023-08596-z
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DOI: https://doi.org/10.1007/s10853-023-08596-z