Abstract
Organic thin film transistors with P3HT (poly-3-hexylthiophene) as active semiconducting layer, channel lengths from 0.3 to 20 μm, and gate oxide thicknesses from 15 to 170 nm have been successfully fabricated on Si substrates. The measurement results show that the channel length over oxide thickness ratio should be large enough (i.e., the vertical electric field should be at least 10 times higher than the lateral electric filed) in order to suppress the short channel effects of transistors. The field effect mobility of long channel devices (L ≥ 5 μm) is about an order of magnitude larger than small channel devices (L from 0.3 to 2.5 μm), which could be attributed to the more severe contact resistance effects between organic materials and metal contacts for devices with smaller dimensions.
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Xu Y, Berger PR (2004) J Appl Phys 95:1497
Wang JZ, Zheng ZH, Sirringhaus H (2006) Appl Phys Lett 89:083513
Tukagoshi K, Fujimori F, Minari T, Miyadera T, Hamano T, Aoyagi Y (2007) Appl Phys Lett 91:113508
Chen Y, Zhu WW, Xiao S, Shih I (2004) J Vac Sci Technol 22:768
Haddock JN, Zhang X, Zheng S, Marder SR, Kippelen B (2005) Proce SPIE 11:5940
Chabinyc ML, Lu J-P, Street RA, Wu Y, Liu P, Ong BS (2004) J Appl Phys 96:2063
Xu Y, Berger PR (2004) J Appl Phys 95:1497
Wang L, Fine D, Basu D, Dodabalapur A (2007) J Appl Phys 101:054515
Leufgen M, Bass U, Muck T, Borzenko T, Schmidt G, Geurts J, Wagner V, Molenkamp LW (2004) Synth Met 146:341
Klauk H, Schmid G, Zhou L, Sheraw CD, Huang J, Nichols JA, Jackson TN (2001) In: Inter Semi Cond Dev Reas Symp Proc, p 349
Maeda T, Kato H, Kawakami H (2006) Appl Phys Lett 89:123508
Gundlach DJ, Zhou L, Nichols JA, Jackson TN, Necliudov PV, Shur MS (2006) J Appl Phys 100:024509
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Chen, Y., Shih, I. Scaling down of organic thin film transistors: short channel effects and channel length-dependent field effect mobility. J Mater Sci 44, 280–284 (2009). https://doi.org/10.1007/s10853-008-3047-6
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DOI: https://doi.org/10.1007/s10853-008-3047-6