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Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target

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Abstract

Polycrystalline thin films of Ti-doped indium oxide (indium–titanium-oxide, ITiO) were prepared by d.c. magnetron sputtering and their electrical and optical properties were investigated. Doping of Ti was effective in improvement of the electroconductivity of the indium oxide: the electrical resistivity of 1.7 × 10−3 Ω cm of non-doping decreased to minimum value of 1.8 × 10−4 Ω cm at 2.4 at.% Ti-doping when the films were deposited at 300 °C. The polycrystalline ITiO films of 0.8–1.6 at. % Ti-doping showed the high Hall mobilitiy (82–90 cm2 V−1 s−1) and the relatively low carrier density (2.4–3.5 × 1020 cm−3) resulting in characteristics of both low resistivity (2.1–3.0 × 10−4 Ω cm) and high transmittance in the near-infrared region (over 80% at 1550 nm), which cannot be shown in the conventional Sn-doped indium oxide (ITO) films.

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References

  1. Weiher RL (1962) J Appl Phys 33:2834

    Article  CAS  Google Scholar 

  2. Hamberg I, Granqvist CG (1986) J Appl Phys 60:R123

    Article  CAS  Google Scholar 

  3. Koh H, Sawada K, Ohgawara M, Kuwata K, Akatsuka M, Matsuhiro M (1988) SID Digest Tech Pap 19:53

    Google Scholar 

  4. Kobayashi H, Ishida T, Nakato Y, Tsubomura H (1991) J Appl Phys 69:1736

    Article  CAS  Google Scholar 

  5. Shigasato Y, Paine DC (1993) Appl Phys Lett 62:1268

    Article  Google Scholar 

  6. Yamada N, Shigesato Y, Yasui I, Li H, Ujihira Y, Nomura K (1998) Hyperfine Interact 112:213

    Article  CAS  Google Scholar 

  7. Song PK, Shigesato Y, Yasui I, Ow-Yang CW, Paine DC (1998) Jpn J Appl Phys 37:1870

    Article  CAS  Google Scholar 

  8. Vossen JL (1971) RCA Rev 32:289

    CAS  Google Scholar 

  9. Kanai Y (1984) Jpn J Appl Phys 23:127

    Article  CAS  Google Scholar 

  10. Abe Y, Nakayama T, Ohara G, Terashima A, Mori H (2004) In Proc thin film materials and devices Meeting. p. 159

  11. Shigesato Y, Paine DC (1993) Appl Phys Lett 62:1268

    Article  CAS  Google Scholar 

  12. Kowalsky M, Neyer A, Mevenkamp W, Rottmann F, Pohlmann T, Voges E (1989) Proc SPIE Int Soc Opt Eng 1141:248

    Google Scholar 

  13. Ide M, Suguro A, Hosaka Y, Katsunuma A, Takahashi K, Shiraishi A (2004) Opt Rev 11:132

    Article  CAS  Google Scholar 

Download references

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  1. Ichikawa Research Laboratory, Sumitomo Metal Mining Co., Ltd., Nakakokubun, Ichikawa-shi, Chiba, 272-8588, Japan

    Yoshiyuki Abe & Noriko Ishiyama

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  1. Yoshiyuki Abe
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  2. Noriko Ishiyama
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Correspondence to Yoshiyuki Abe.

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Abe, Y., Ishiyama, N. Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target. J Mater Sci 41, 7580–7584 (2006). https://doi.org/10.1007/s10853-006-0844-7

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  • DOI: https://doi.org/10.1007/s10853-006-0844-7

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