Abstract
Mobility calculation is a difficult task due to the stochastic nature of the particles in a device. This is especially true for a device operated in the sub-threshold region because the transport is a combination of diffusion and drift albeit diffusion dominated. As a result, one can calculate the mobility based on the drift and the diffusion techniques for a device operated in the subthreshold regime. We have developed a transport model, based on the solution of the Boltzmann Transport Equation, for modeling n-channel silicon-on-insulator (SOI) MOSFETs and MESFETs using the Ensemble Monte Carlo technique. All relevant scattering mechanisms for the silicon material system have been included in the model. The model is used to calculate both the diffusion coefficient and the drift based mobility and the results are compared with available experimental values. The mobility of the equivalent SOI MESFET device is a factor of 3–5 times higher than that of the MOSFET in the sub-threshold regime.
Similar content being viewed by others
References
T.J. Thornton “Physics and applications of the Schottky junction transistor,” IEEE Trans. Electron Devices, 48, 2421 (2001).
T. Khan et al., “Treatment of interface roughness in SOI- MESFETs,” Journal of Vac. Science & Tech. B, 22(4), 2110 (2004).
D. Esseni et al., “Low field electron and hole mobility of SOI transistors fabricated on ultrathin silicon films for deep submicrometer technology application,” IEEE Trans. Electron Devices, 48, 2842 (2001).
R. Brunetti et al.,“Diffusion coefficient of electrons in silicon,” J. Appl. Phys., 52, 6713 (1981).
D.K. Ferry et al.,“ Diffusion in the transient dynamic response regime,” Phys. Lett. A, 78, 379 (1980).
R. Fauquembergue et al., “Diffusion and the power spectral density and correlation function of velocity fluctuation for electrons in Si and GaAs by Monte Carlo methods,” J. Appl. Phys., 51, 1065 (1980).
C. Jacoboni et al., The Monte Carlo Method for Semiconductor Device Simulation (Springer-Verlag, 1989).
C. Herring et al., “Transport and deformation-potential theory for many-valley semiconductors with anisotropic scattering,” Phys. Rev., 101, 944 (1956).
D.K. Ferry, “First-order optical and intervalley scattering in semiconductors,” Phys. Rev. B, 14, 1605 (1976).
W.J. Gross et al., “3D simulations of ultra-small MOSFET with real-space treatment of the electron-electron and electron-ion interactions,” VLSI Design, 10, 437 (2000).
M.V. Fischetti et al., “Long-range coulomb interactions in small silicon devices. Part I: Performance and reliability,” J. Appl. Phys., 89, 1205 (2001).
B.K. Ridley, Quantum Processes in Semiconductors (Oxford University Press, 1999).
A.M. Cowley et al., “Surface states and barrier height of metal-semiconductor system,” J. Appl. Phys., 36, 3212 (1965).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Tarik, K., Ahmed, S., Vasileska, D. et al. Subthreshold Mobility Extraction for SOI-MESFETs. J Comput Electron 3, 243–246 (2004). https://doi.org/10.1007/s10825-004-7054-9
Issue Date:
DOI: https://doi.org/10.1007/s10825-004-7054-9