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Obtaining thin layers of silicon dioxide on quartz

  • Science for Glass Production
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The possibilities of depositing thin layers of silicon dioxide on the surface quartz are investigated as functions of the chemical composition of the initial reagents and the process conditions. It is shown that silicon chloride and alcoholates can be used for deposition.

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References

  1. Proceedings of the 5th All-Union Conference on the Glassy State [in Russian], Nauka, Leningrad (1971).

  2. The Chemist’s Handbook [in Russian], Khimiya, Leningrad (1971), Vol. 1.

  3. Optical Materials for Infrared Technology [in Russian], Nauka, Moscow (1965).

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Authors and Affiliations

  1. “Krasnogorsk zavod im. S. A. Zvereva” JSC, Krasnogorsk, Moscow oblast’, Russia

    V. V. Potelov

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  1. V. V. Potelov
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Translated from Steklo i Keramika, No. 2, pp. 9–11, February, 2009.

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Potelov, V.V. Obtaining thin layers of silicon dioxide on quartz. Glass Ceram 66, 50–52 (2009). https://doi.org/10.1007/s10717-009-9121-y

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  • DOI: https://doi.org/10.1007/s10717-009-9121-y

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