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Structural analysis of oxygen segregated Nb(110) surface by photoelectron diffraction

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Czechoslovak Journal of Physics Aims and scope

Abstract

The atomic structure of the Nb(110) surface with oxygen segregated from bulk by annealing at 1500K in UHV has been analyzed by electron and photoelectron diffraction techniques. The observed LEED patterns indicate the modulation of topmost Nb layer in [11¯0] direction. Relation of unit cells of substrate and overlayer was determined. The surface component in the Nb 3d photoelectron spectra has a chemical shift of 1.6eV corresponding to that of NbO. The thickness of Nb oxide overlayer is estimated to be about one or two atomic layers. The Nb 3d spectra collected at 4945 different directions are fitted with bulk and surface components. Photoelectron diffraction patterns from Nb atoms within overlayer as well as bulk are successfully extracted. Topmost oxygen atoms are found to be located at about 1.2 Å above the Nb plane.

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Author notes

  1. Michiaki Fujikado

    Present address: Nabtesco Corp., Miyashiro, Tarui, Gifu, Japan, 503-2192

Authors and Affiliations

  1. Nara Institute of Science and Technology, CREST-JST, Takayama, Ikoma, Nara, Japan, 630-0192

    Fumihiko Matsui, Michiaki Fujikado & Hiroshi Daimon

  2. Department of Physics, University of California Davis, Davis, CA, 95616, U.S.A.

    Brian C. Sell & Charles S. Fadley

  3. Photon Ltd., 7-27-1, Hikaridai, Seika, Kyoto, Japan, 619-0237

    Atsushi Kobayashi

Authors
  1. Fumihiko Matsui
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  2. Michiaki Fujikado
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  3. Hiroshi Daimon
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  4. Brian C. Sell
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  5. Charles S. Fadley
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  6. Atsushi Kobayashi
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Matsui, F., Fujikado, M., Daimon, H. et al. Structural analysis of oxygen segregated Nb(110) surface by photoelectron diffraction. Czech J Phys 56, 61–68 (2006). https://doi.org/10.1007/s10582-006-0066-x

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  • DOI: https://doi.org/10.1007/s10582-006-0066-x

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