Abstract
In this study, WO3:Co thin films with different percentages of cobalt concentration were deposited by spray pyrolysis on glass substrates at T = 400 °C and annealed at T = 500 °C for 1 h in the furnace. Tungsten oxide thin films with cobalt impurity are deposited by adding the cobalt chloride with different percentages of 0–5–10–15–20% and 30% to the initial solution and the effect of Co–doping on structural, morphological, optical, and electrochromic properties were studied. Then, structural, optical, morphology, and electrochemical properties of the films were characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), UV-Vis spectroscopy, and cyclic voltammetry (I–V). The X-ray diffraction results of WO3:Co thin films showed that the structure of the thin films before annealing is amorphous. After annealing, the thin films are polycrystalline with monoclinic and hexagonal WO3 phases, and a combined phase of CoWO4 and W17O49 unstable phase. The bandgap was also calculated using the UV-Vis spectrum. Also, the electrochromatic properties of the thin films are analyzed by cyclic voltammetry analysis. The results of the electrochromatic cycles showed that the WO3 sample with a 20% cobalt impurity has a significant color variation.
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Dalenjan, F.A., Bagheri–Mohagheghi, M.M. & Shirpay, A. The effect of cobalt (Co) concentration on structural, optical, and electrochemical properties of tungsten oxide (WO3) thin films deposited by spray pyrolysis. J Solid State Electrochem 26, 401–408 (2022). https://doi.org/10.1007/s10008-021-05076-9
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DOI: https://doi.org/10.1007/s10008-021-05076-9