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Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications

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Abstract

In this work, tungsten oxide (WO3) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO3 films immersed in the two different electrolyte solutions (H2SO4 and LiClO4 with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H2SO4 electrolyte of an annealed WO3 thin film at 2 SCCM demonstrated high coloring efficiency of 50.18 cm2/C, and the LiClO4 electrolyte of an annealed WO3 thin film at 4 SCCM demonstrated high coloring efficiency of 20.06 cm2/C.

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Acknowledgments

The authors thank the Nitte Meenakshi Institute of Technology, Bengaluru, India, for providing facilities, and the work was supported by the Researchers Supporting Project number (RSPD2023R765), King Saud University, Riyadh, Saudi Arabia.

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Authors and Affiliations

  1. Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India

    K. Naveen Kumar, G. V. Ashok Reddy & Sheik Abdul Sattar

  2. Centre for Nano-materials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India

    K. Naveen Kumar

  3. Department of Physics and Electronics, Christ University, Hosur Road, Bengaluru, 560029, India

    R. Imran Jafri

  4. Department of Physics, N.M.S.S.V.N. College, Nagamalai, Madurai, Tamil Nadu, 625019, India

    R. Premkumar

  5. Department of Physics, Sona College of Technology, Salem, Tamil Nadu, 636005, India

    M. Muthukrishnan

  6. Department of Chemistry, Jamal Mohamed College (Autonomous), Affiliated to Bharathidasan University, Trichy, Tamil Nadu, 620020, India

    A. Asrar Ahamed

  7. Department of Physics, Sree Ayyappa College for Women, Chunkankadai, Nagercoil, Tamil Nadu, 629 003, India

    M. R. Meera

  8. School of Mechanical Engineering, Yeungnam University, 280 Daehak-ro, Gyoungsan-si, Gyeongsangbuk-do, 38541, Republic of Korea

    Nunna Guru Prakash & Tae Jo Ko

  9. Department of Chemistry, College of Science, King Saud University, P. O. Box 2455, 11451, Riyadh, Saudi Arabia

    Ammar M. Tighezza

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Kumar, K.N., Reddy, G.V.A., Sattar, S.A. et al. Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications. J. Electron. Mater. 53, 2351–2366 (2024). https://doi.org/10.1007/s11664-024-11000-4

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