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Electrochemical formation of anodic oxide films on Nb surfaces: ellipsometric and Raman spectroscopical studies

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Abstract

Electrochemical formation of anodic oxide films on niobium (Nb) surfaces in 1 M H2SO4 solutions was studied using ellipsometry and Raman spectroscopy. By in situ ellipsometric measurements, the coefficient of film thickness growth and the complex index of refraction of anodic oxide films in the voltage range between 0 and 100 V were determined. The Raman spectra reveal that the thin passive films are amorphous. In the beginning of crystallization, the anodic oxide films consist of mixtures of NbO2 and Nb2O5, while NbO2 is completely transformed to Nb2O5 for thicker and well-crystallized films.

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Acknowledgements

The authors would like to thank the Deutsches Zentrum für Luft- und Raumfahrt e. V. (DLR), the Internationales Büro des BMBF (Mrs. Baranski, Dr. Meyer, and Mrs. Sack) and the Ministry for Research of the Republic of Macedonia for financial support and organization.

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Authors and Affiliations

  1. Faculty of Technology and Metallurgy, University “St. Cyril and Methodius”, 1000, Skopje, Macedonia

    Irena Arsova & Ljubomir Arsov

  2. Institut fur Physikalische Chemie und Elektrochemie, TU Dresden, Germany

    Niels Hebestreit, Andreas Anders & Waldfried Plieth

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  1. Irena Arsova
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  2. Ljubomir Arsov
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  3. Niels Hebestreit
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  4. Andreas Anders
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  5. Waldfried Plieth
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Correspondence to Niels Hebestreit.

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Arsova, I., Arsov, L., Hebestreit, N. et al. Electrochemical formation of anodic oxide films on Nb surfaces: ellipsometric and Raman spectroscopical studies. J Solid State Electrochem 11, 209–214 (2007). https://doi.org/10.1007/s10008-005-0089-4

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  • DOI: https://doi.org/10.1007/s10008-005-0089-4

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