Abstract
The structural and electronic properties of h-BN sheet implanted with X atoms (X = lithium (Li), beryllium (Be), aluminum (Al), carbon (C), and silicon (Si)) have been investigated to tune its band gap to amend its insulating behavior toward semiconducting material employing density functional theory (DFT). It has been observed that on replacing nitrogen or boron (N/B) atom with impurity atom, several impurity levels appear in band gap dividing big gap into small energy gaps, albeit to a different extent, depending upon the dopant element and substitutional site. The lowest value of band gap falls as low as 2.27 eV as compared to 4.63 eV of pristine h-BN in addition to the appearance of states at the Fermi level. Additionally; geometrical, interaction of foreign elements with the host material, and stability issues are discussed. These results are affable for its usage in transistor-based devices and to explore its new applications in high-power electronic and optoelectronic devices.
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Data was calculated by Qurat ul Ain Asif and Akhtar Hussain.
Code availability
VASP code was provided by Akhtar Hussain.
References
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Acknowledgments
The authors would like to thank the substantial support by PINSTECH; Government College University, Faisalabad, Punjab, Pakistan, and the University of the Punjab, Lahore, Pakistan. Special thanks to Haris Akram Bhatti for fruitful discussions.
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Qurat ul Ain Asif gave the main idea, drafted the manuscript, prepared, and calculated the data; Akhtar Hussain provided the VASP code, calculated the data, and reviewed the manuscript carefully; Muhammad Kashif and Muhammad Tayyab helped in plotting of results; Hafiz Muhammad Rafique provided guidance and helped in defining the results.
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Asif, Q.u.A., Hussain, A., Kashif, M. et al. Computational study of electronic properties of X-doped hexagonal boron nitride (h-BN): X = (Li, Be, Al, C, Si). J Mol Model 27, 319 (2021). https://doi.org/10.1007/s00894-021-04938-3
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DOI: https://doi.org/10.1007/s00894-021-04938-3