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Synthesis of nanostructured based carbon nanowalls at low temperature using inductively coupled plasma chemical vapor deposition (ICP-CVD)

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Abstract

Synthesis of carbon nanowalls using inductively coupled plasma chemical vapor deposition is investigated in this article. This paper reports the growth of nanowalls at low temperature with effective results. Xylene was tested in combination with Ni film as catalyst to grow nanowalls. Various substrates, parameters and conditions were used for the growth purposes. Results obtained with xylene were promising for the growth of nanostructured based carbon nanowalls in the investigated parameter range. Results has been confirmed using scanning electron microscope, optical emission spectroscopy and Raman spectroscopy.

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Authors and Affiliations

  1. Department of Microsystems Engineering, IMTEK, University of Freiburg, Freiburg, 79110, Germany

    Rizwan Shoukat

  2. Department of Electrical Engineering, University of Hail, Hail, 2440, Saudi Arabia

    Muhammad Imran Khan

  3. Micro/-Nano Electronic System Integration R&D Center (MESIC), University of Science and Technology of China (USTC), Hefei, 230027, Anhui, China

    Muhammad Imran Khan

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  1. Rizwan Shoukat
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  2. Muhammad Imran Khan
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Correspondence to Rizwan Shoukat.

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Shoukat, R., Khan, M.I. Synthesis of nanostructured based carbon nanowalls at low temperature using inductively coupled plasma chemical vapor deposition (ICP-CVD). Microsyst Technol 25, 4439–4444 (2019). https://doi.org/10.1007/s00542-019-04463-7

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  • DOI: https://doi.org/10.1007/s00542-019-04463-7

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